BEGIN:VCALENDAR
VERSION:2.0
PRODID:IEEE vTools.Events//EN
CALSCALE:GREGORIAN
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TZID:America/Sao_Paulo
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DTSTART:20181104T010000
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BEGIN:VEVENT
DTSTAMP:20190829T162320Z
UID:3E2F8662-29FF-4D5B-88ED-E3FE3B947E63
DTSTART;TZID=America/Sao_Paulo:20180316T140000
DTEND;TZID=America/Sao_Paulo:20180316T160000
DESCRIPTION:Very Large Scale Integration (VLSI) integrated circuits using n
 anotechnology require new materials\, structures\, and CAD tools to deal w
 ith problems arising from the manufacturing process\, such as variability.
  Some types of design are more or less robust to process or environmental 
 variations\, either systematic or random. This presentation evaluates the 
 behavior of FinFET technology in technologies beyond 20nm. FinFet technolo
 gy is a substitute for CMOS technology in the manufacturing process. Predi
 ctive information about the behavior of this technology in the cell design
  is important for both designers and developers of EDA tools.\n\nSpeaker(s
 ): Cristina Meinhardt\, \n\nPorto Alegre\, Rio Grande do Sul\, Brazil
LOCATION:Porto Alegre\, Rio Grande do Sul\, Brazil
ORGANIZER:jrfazambuja@gmail.com
SEQUENCE:2
SUMMARY:CASS Talk with Cristina Meinhardt
URL;VALUE=URI:https://events.vtools.ieee.org/m/179243
X-ALT-DESC:Description: <br /><p>Very Large Scale Integration (VLSI) integr
 ated circuits using nanotechnology require new materials\, structures\,&nb
 sp\;and CAD tools to deal with problems arising from the manufacturing pro
 cess\, such as variability.&nbsp\;Some types of design are more or less ro
 bust to process or environmental variations\, either systematic or random.
  This presentation evaluates the behavior of FinFET technology in technolo
 gies beyond 20nm. FinFet technology is a substitute for&nbsp\;CMOS technol
 ogy in the manufacturing process. Predictive information about the behavio
 r of this technology in the&nbsp\;cell design is important for both design
 ers and developers of EDA tools.</p>
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