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DTSTART:20201025T020000
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DTSTAMP:20201001T165517Z
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DESCRIPTION:The joint MOS-AK Workshop and Symposium on Schottky Barrier MOS
  (SB-MOS) devices is held from September 29th to October 1st 2020 at the T
 echnische Hochschule Mittelhessen – University of Applied Sciences\, Ger
 many. This is the first joint R&amp;D event between MOS-AK and Symposium of SB
 -MOS. Additionally\, in the time frame an IEEE EDS Mini-Colloquium on „N
 on-conventional Devices and Technologies“ will take place.\n\nThis year 
 the joint R&amp;D event is sponsored by THM\, the IEEE EDS Germany chapter\, I
 EEE Young Professionals Germany Affinity Group\, AdMOS GmbH\, and organize
 d by Dr. Laurie Calvet (C2N\, Palaiseau\, France)\, Dr. Mike Schwarz (Robe
 rt Bosch GmbH\, NanoP THM\, Germany)\, Dr. Wladek Grabinski (MOS-AK Associ
 ation\, EU)\, Prof. Alexander Kloes (NanoP THM\, Germany)\, and the staff 
 at the Center for Nanotechnology and Photonics at TH Mittelhessen.\n\nOur 
 joint R&amp;D event starts on September 29th at 9:15 am with a MOS-AK workshop
 . The workshop continues on September 30th morning to noon. In the afterno
 on\, the IEEE EDS Mini-Colloquium „Non-Conventional Devices and Technolo
 gies“ will take place and will continue during the moring of October 1st
  . In the afternoon\, the Symposium on SB-MOS is held. The event will be v
 irtual due to the world pandemic of COVID-19.\n\nAttendees are welcome to 
 participate in our joint R&amp;D event. The attendees are limited in total to 
 300. Further information is present at\n\nSymposium of SBMOS\n[https://ssb
 mos.blogspot.com](https://ssbmos.blogspot.com/)\n\nand\n\nMOS-AK\nhttp://w
 ww.mos-ak.org/giessen_2020\n\nCo-sponsored by: IEEE EDS Germany chapter\, 
 IEEE Young Professionals Germany Affinity Group\n\nVirtual\, Hessen\, Germ
 any\, 35390
LOCATION:Virtual\, Hessen\, Germany\, 35390
ORGANIZER:mike.schwarz1980@googlemail.com
SEQUENCE:14
SUMMARY:Symposium on Schottky barrier MOS devices 2020
URL;VALUE=URI:https://events.vtools.ieee.org/m/205569
X-ALT-DESC:Description: &lt;br /&gt;&lt;p&gt;&lt;span id=&quot;ember979&quot; class=&quot;ember-view&quot;&gt;The
  joint &lt;strong&gt;MOS-AK Workshop&lt;/strong&gt; and &lt;strong&gt;Symposium on Schottky 
 Barrier MOS (SB-MOS) devices&lt;/strong&gt; is held from September 29&lt;sup&gt;th&lt;/su
 p&gt; to October 1&lt;sup&gt;st&lt;/sup&gt; 2020 at the Technische Hochschule Mittelhesse
 n &amp;ndash\; University of Applied Sciences\, Germany. This is the first joi
 nt R&amp;amp\;D event between MOS-AK and Symposium of SB-MOS. Additionally\, i
 n the time frame an &lt;strong&gt;IEEE EDS Mini-Colloquium on &amp;bdquo\;Non-conven
 tional Devices and Technologies&amp;ldquo\;&lt;/strong&gt; will take place.&lt;br /&gt;&lt;/s
 pan&gt;&lt;/p&gt;\n&lt;p&gt;&lt;span id=&quot;ember979&quot; class=&quot;ember-view&quot;&gt;This year the joint R&amp;
 amp\;D event is sponsored by THM\, the IEEE EDS Germany chapter\, IEEE You
 ng Professionals Germany Affinity Group\, AdMOS GmbH\, and organized by Dr
 . Laurie Calvet (C2N\, Palaiseau\, France)\, Dr. Mike Schwarz (Robert Bosc
 h GmbH\, NanoP THM\, Germany)\, Dr. Wladek Grabinski (MOS-AK Association\,
  EU)\, Prof. Alexander Kloes (NanoP THM\, Germany)\, and the staff at the 
 Center for Nanotechnology and Photonics at TH Mittelhessen.&amp;nbsp\;&lt;/span&gt;&lt;
 br /&gt; &lt;br /&gt; Our joint R&amp;amp\;D event starts on &lt;span id=&quot;ember979&quot; class=
 &quot;ember-view&quot;&gt;September 29&lt;/span&gt;&lt;sup&gt;th&amp;nbsp\;&lt;/sup&gt;at 9:15 am with a MOS-
 AK workshop. The workshop continues on September &lt;span id=&quot;ember979&quot; class
 =&quot;ember-view&quot;&gt;30&lt;/span&gt;&lt;sup&gt;th &lt;/sup&gt;morning to noon. In the afternoon\, t
 he IEEE EDS Mini-Colloquium &amp;bdquo\;Non-Conventional Devices and Technolog
 ies&amp;ldquo\; will take place and will continue during the moring of&amp;nbsp\; 
 October &lt;span id=&quot;ember979&quot; class=&quot;ember-view&quot;&gt;1&lt;/span&gt;&lt;sup&gt;st&lt;/sup&gt; . In 
 the afternoon\, the Symposium on SB-MOS&amp;nbsp\;is held. The event will be v
 irtual due to the world pandemic of COVID-19.&lt;br /&gt; &lt;br /&gt;Attendees are we
 lcome to participate in our joint R&amp;amp\;D event. The attendees are limite
 d in total to 300. Further information is present at&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;Sympo
 sium of SBMOS&lt;br /&gt;&lt;/strong&gt;&lt;a href=&quot;https://ssbmos.blogspot.com/&quot;&gt;https:/
 /ssbmos.blogspot.com&lt;/a&gt;&lt;/p&gt;\n&lt;p&gt;and&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;MOS-AK&lt;br /&gt; &lt;/strong
 &gt;&lt;a href=&quot;http://www.mos-ak.org/giessen_2020&quot;&gt;http://www.mos-ak.org/giesse
 n_2020&lt;/a&gt;&lt;/p&gt;
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