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PRODID:IEEE vTools.Events//EN
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TZID:Canada/Eastern
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DTSTART:20220313T030000
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DTSTART:20221106T010000
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BEGIN:VEVENT
DTSTAMP:20220414T163758Z
UID:57382B85-F5A9-4755-B542-7698C37C055A
DTSTART;TZID=Canada/Eastern:20220412T134500
DTEND;TZID=Canada/Eastern:20220412T143000
DESCRIPTION:Progress in the field of integrated photonics has been greatly 
 accelerated by leveraging the existing microelectronics fabrication infras
 tructure. However\, the fabrication of nanophotonic circuits carries a new
  set of challenges due to the high sensitivity of light–matter interacti
 ons. As the devices of integrated photonic circuits become smaller and mor
 e complex to satisfy increasing demands for performance\, random errors an
 d systematic inaccuracies in fabrication can cause significant reductions 
 in real-world performance. In this lecture\, we will discuss modern method
 s of fabricating photonic circuits\, the challenges in fabricating next-ge
 neration designs\, as well as current and near-future methods of overcomin
 g these challenges.\n\nSpeaker(s): Dusan Gostimirovic\, \n\nRoom: TR0070\,
  Bldg: Trottier Engineering Building\, McGill University\, Department of E
 lectrical and Computer Engineering\, Montreal\, Quebec\, Canada\, Virtual:
  https://events.vtools.ieee.org/m/310883
LOCATION:Room: TR0070\, Bldg: Trottier Engineering Building\, McGill Univer
 sity\, Department of Electrical and Computer Engineering\, Montreal\, Queb
 ec\, Canada\, Virtual: https://events.vtools.ieee.org/m/310883
ORGANIZER:odile@ieee.org
SEQUENCE:2
SUMMARY:Challenges in the Fabrication of Nanophotonic Integrated Circuits
URL;VALUE=URI:https://events.vtools.ieee.org/m/310883
X-ALT-DESC:Description: &lt;br /&gt;&lt;p&gt;Progress in the field of integrated photon
 ics has been greatly accelerated by leveraging the existing microelectroni
 cs fabrication infrastructure. However\, the fabrication of nanophotonic c
 ircuits carries a new set of challenges due to the high sensitivity of lig
 ht&amp;ndash\;matter interactions. As the devices of integrated photonic circu
 its become smaller and more complex to satisfy increasing demands for perf
 ormance\, random errors and systematic inaccuracies in fabrication can cau
 se significant reductions in real-world performance. In this lecture\, we 
 will discuss modern methods of fabricating photonic circuits\, the challen
 ges in fabricating next-generation designs\, as well as current and near-f
 uture methods of overcoming these challenges.&lt;/p&gt;
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