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DTSTAMP:20230415T021103Z
UID:42F9CC37-4C6B-4467-9580-1C42610286D2
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DESCRIPTION:Wide bandgap semiconductor devices based on GaN and SiC offer m
 yriads of advantages over traditional Si-based devices for applications in
  power electronics. These advantages include\, among others\, faster switc
 hing capabilities\, allowing for reduced filtering components within conve
 rter topologies\, thus leading to improved power density. Despite their ma
 ny advantages\, several challenges related to technological readiness leve
 l have hindered the widespread adoption of these devices. At the device-ph
 ysics level\, for example\, the theoretical high voltage capability of GaN
  has yet to be commercially realized. At the device-circuits level\, the f
 ast-switching capability of SiC\, though generally a beneficial attribute\
 , has led to undesirable injected harmonic content into power electronic c
 onverters\, leading to detrimental circuit-behavior. For these reasons\, a
 dvanced modeling\, and characterization methods for both GaN and SiC are n
 eeded\, so that these devices can realize their full performance entitleme
 nt. This talk will present a broad array of modeling and characterization 
 methodologies for GaN and SiC semiconductors. Device physics simulations u
 sing finite element modeling techniques will be presented\, demonstrating 
 the high voltage capability of vertical GaN diodes. It will be shown how t
 hese types of models can lead to the design and fabrication of future high
  voltage and reliable vertical GaN devices. Analytical physics-based model
 s of GaN diodes\, based on first principles\, will also be presented. For 
 these types of models\, tradeoffs between model-fidelity and convergence-t
 ime in circuit-simulations will be discussed. Behavioral models of SiC MOS
 FETs\, based on mathematical curve-fitted equations\, will then be present
 ed. These models will demonstrate the need to capture the frequency-depend
 ence of the device’s parasitic per-terminal junction capacitances\, as w
 ell as that of the parasitic package inductances\, in order to construct a
  comprehensive empirically validated high-fidelity circuit-simulation. New
  strategies that can enable the development of hybrid-physics and -behavio
 ral models will be presented\, in a manner that offers utility to both dev
 ice fabrication engineers\, as well as application-circuit designers. For 
 the various types of models presented\, the importance of the interplay an
 d refinement between simulation and empirical validation will be emphasize
 d. This talk will conclude with characterization techniques and opportunit
 ies for wide bandgap semiconductors in space. The work presented in this t
 alk lends itself well to developing strategies for multilevel integrated m
 odeling infrastructures of next generation GaN and SiC devices\, and to ai
 d in the design\, fabrication\, and implementation of future high-voltage 
 and reliable wide and ultrawide bandgap semiconductors.\n\nSpeaker(s): Pro
 f. Raghav Khanna\, \n\nRoom: 4th Floor\, Room 4021\, Bldg: Sobrato Campus 
 for Discovery and Innovation (SCDI)\, 500 El Camino Real\, Santa Clara Uni
 versity’s Frugal Innovation Hub\, Santa Clara\, California\, United Stat
 es\, 95053
LOCATION:Room: 4th Floor\, Room 4021\, Bldg: Sobrato Campus for Discovery a
 nd Innovation (SCDI)\, 500 El Camino Real\, Santa Clara University’s Fru
 gal Innovation Hub\, Santa Clara\, California\, United States\, 95053
ORGANIZER:kishan.g.joshi@gmail.com
SEQUENCE:11
SUMMARY:Wide Bandgap Semiconductors: Opportunities and Challenges for Impro
 ved Modeling and Characterization Methods in Power Electronic Applications
URL;VALUE=URI:https://events.vtools.ieee.org/m/340643
X-ALT-DESC:Description: &lt;br /&gt;&lt;p data-key=&quot;94&quot;&gt;&lt;span data-key=&quot;95&quot;&gt;Wide ban
 dgap semiconductor devices based on GaN and SiC offer myriads of advantage
 s over traditional Si-based devices for applications in power electronics.
  These advantages include\, among others\, faster switching capabilities\,
  allowing for reduced filtering components within converter topologies\, t
 hus leading to improved power density. Despite their many advantages\, sev
 eral challenges related to technological readiness level have hindered the
  widespread adoption of these devices. At the device-physics level\, for e
 xample\, the theoretical high voltage capability of GaN has yet to be comm
 ercially realized. At the device-circuits level\, the fast-switching capab
 ility of SiC\, though generally a beneficial attribute\, has led to undesi
 rable injected harmonic content into power electronic converters\, leading
  to detrimental circuit-behavior. For these reasons\, advanced modeling\, 
 and characterization methods for both GaN and SiC are needed\, so that the
 se devices can realize their full performance entitlement. This talk will 
 present a broad array of modeling and characterization methodologies for G
 aN and SiC semiconductors. Device physics simulations using finite element
  modeling techniques will be presented\, demonstrating the high voltage ca
 pability of vertical GaN diodes. It will be shown how these types of model
 s can lead to the design and fabrication of future high voltage and reliab
 le vertical GaN devices. Analytical physics-based models of GaN diodes\, b
 ased on first principles\, will also be presented. For these types of mode
 ls\, tradeoffs between model-fidelity and convergence-time in circuit-simu
 lations will be discussed. Behavioral models of SiC MOSFETs\, based on mat
 hematical curve-fitted equations\, will then be presented. These models wi
 ll demonstrate the need to capture the frequency-dependence of the device&amp;
 rsquo\;s parasitic per-terminal junction capacitances\, as well as that of
  the parasitic package inductances\, in order to construct a comprehensive
  empirically validated high-fidelity circuit-simulation. New strategies th
 at can enable the development of hybrid-physics and -behavioral models wil
 l be presented\, in a manner that offers utility to both device fabricatio
 n engineers\, as well as application-circuit designers. For the various ty
 pes of models presented\, the importance of the interplay and refinement b
 etween simulation and empirical validation will be emphasized. This talk w
 ill conclude with characterization techniques and opportunities for wide b
 andgap semiconductors in space. The work presented in this talk lends itse
 lf well to developing strategies for multilevel integrated modeling infras
 tructures of next generation GaN and SiC devices\, and to aid in the desig
 n\, fabrication\, and implementation of future high-voltage and reliable w
 ide and ultrawide bandgap semiconductors.&lt;/span&gt;&lt;/p&gt;
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