BEGIN:VCALENDAR VERSION:2.0 PRODID:IEEE vTools.Events//EN CALSCALE:GREGORIAN BEGIN:VTIMEZONE TZID:America/Los_Angeles BEGIN:DAYLIGHT DTSTART:20230312T030000 TZOFFSETFROM:-0800 TZOFFSETTO:-0700 RRULE:FREQ=YEARLY;BYDAY=2SU;BYMONTH=3 TZNAME:PDT END:DAYLIGHT BEGIN:STANDARD DTSTART:20231105T010000 TZOFFSETFROM:-0700 TZOFFSETTO:-0800 RRULE:FREQ=YEARLY;BYDAY=1SU;BYMONTH=11 TZNAME:PST END:STANDARD END:VTIMEZONE BEGIN:VEVENT DTSTAMP:20231202T005441Z UID:D313C009-4B9C-41A3-9209-EA321D7E8A20 DTSTART;TZID=America/Los_Angeles:20230426T113000 DTEND;TZID=America/Los_Angeles:20230427T132000 DESCRIPTION:[Atomic Layer Deposition of 2D Dichalcogenides at Wafer Scale] \n\nNano Journal Club (11:30 am - 12 noon)\n\nNano Journal Club is hosting a discussion of the article titled:\n\n[Challenges for Nanoscale CMOS Log ic Based on 2D Materials](https://stats.sender.net/link_click/FRPfAVdc3N_B Geds/dfa65620596de66beb5b39ac6343e192)\n\nhttps://stats.sender.net/link_cl ick/FRPfAVdc3N_BGeds/dfa65620596de66beb5b39ac6343e192\n\nAttendees are enc ouraged to participate in the Nano Journal Club discussion. You can access the paper using the embedded link.\n\nSeminar (12:10 pm - 12:55 pm):\n\nA tomic Layer Deposition of 2D Dichalcogenides at Wafer Scale\n\n2D Transiti on metal dichalcogenide (TMD) materials have opened a route to continue th e down-scaling trend of semiconductor technology.\n\nThe synthesis of conf ormal high quality 2D TMDs on 300 mm wafers is required to unlock the pote ntial application of these materials in electronic devices. EMD Electronic s is establishing a platform for TMD development using atomic layer deposi tion (ALD).\n\nThe talk will be focusing on 300 mm wafer-scale ALD deposit ion of TMD materials at temperatures ranging from 350 to 600 °C. The prop osed ALD approach contributes to the efforts in developing high-quality 2D TMD materials that offer high performance and meet the down-scaling deman d.\n\nIn the past 3 years\, Thong and the EMD Electronics Team at San Jose have been developing an ALD 2D materials platform focusing on TMDs for hi gh mobility channel and Cu barrier/liner applications\n\n[]\n\n[]\n\nDr. T hong Ngo is an R&D engineer at EMD Electronics.\n\nThong finished his Ph.D . in Chemical Engineering from The University of Texas at Austin in 2015. His Ph.D. work explored functional crystalline oxides on Si and Ge for ele ctronics using atomic layer deposition (ALD).\n\nThong joined Intermolecul ar Inc.\, a subsidiary of EMD Electronics\, in 2015 where he has been work ing on materials process development\, characterization\, and integration for memory applications.\n\nHybrid Event\n\nThis will be a Hybrid Event {I n-Person & Zoom linked]\n\nThose planning to attend in person should arriv e early. They will need to complete an electronic check-in before being ad mitted into Intermolecular.\n\nEnter the rear of the building from Orchard Parkway. You should park on the back side off of Orchard Parkway.\n\nIf y ou will be unable to arrive in-person before the seminar starts - please p lan on joining via Zoom\n\nAll ticket registrants will be sent Zoom links before the event. Information will be sent to the email address entered wh en you register.\n\nAgenda: \nAgenda\n\n11:30 AM - 12:00 PM\n\nNano Journa l Club\n\nLincoln Bourne\n\n---------------------------------------------- -----------------\n\nThe following paper will be discussed: "Challenges fo r Nanoscale CMOS Logic Based on 2D Materials"\n\n12:00 PM - 12:10 PM\n\nIn troduction\; Announcements and Speaker Introduction\n\nGlenn Friedman\n\n1 2:10 PM - 12:55 PM\n\nSeminar\n\nThong Ngo\n\n12:55 PM - 1:15 PM\n\nQ & A\ n\nIntermolecular Inc\, 3011 North First Street\, San Jose\, California\, United States\, 95134\, Virtual: https://events.vtools.ieee.org/m/357715 LOCATION:Intermolecular Inc\, 3011 North First Street\, San Jose\, Califor nia\, United States\, 95134\, Virtual: https://events.vtools.ieee.org/m/35 7715 ORGANIZER:g.m.friedman@ieee.org SEQUENCE:10 SUMMARY:Atomic Layer Deposition of 2D Dichalcogenides at Wafer Scale URL;VALUE=URI:https://events.vtools.ieee.org/m/357715 X-ALT-DESC:Description: <br /><div class="has-user-generated-content">\n<di v class="eds-l-mar-vert-6 eds-l-sm-mar-vert-4 eds-text-bm structured-conte nt-rich-text">\n<div class="eds-text--left">\n<h3><em><strong><img src="ht tps://img.evbuc.com/https%3A%2F%2Fcdn.evbuc.com%2Fimages%2F493039029%2F282 37422945%2F1%2Foriginal.20230414-192250?w=600&amp\;auto=format%2Ccompress& amp\;q=75&amp\;sharp=10&amp\;rect=0%2C41%2C1280%2C640&amp\;s=c05ad94a6bf94 cccba4a0ecd1113abc0" alt="Atomic Layer Deposition of 2D Dichalcogenides a t Wafer Scale" /></strong></em></h3>\n<h3><em><strong>Nano Journal Club (1 1:30 am - 12 noon)</strong></em></h3>\n<p><strong>Nano Journal Club is hos ting a discussion of the article titled:</strong></p>\n<h3><a href="https: //stats.sender.net/link_click/FRPfAVdc3N_BGeds/dfa65620596de66beb5b39ac634 3e192" target="_blank" rel="nofollow noopener noreferrer">Challenges for N anoscale CMOS Logic Based on 2D Materials</a></h3>\n<p>https://stats.sende r.net/link_click/FRPfAVdc3N_BGeds/dfa65620596de66beb5b39ac6343e192</p>\n<p ><strong>Attendees are encouraged to participate in the Nano Journal Club discussion. You can access the paper using the embedded link.</strong></p> \n</div>\n</div>\n<div class="eds-l-mar-vert-6 eds-l-sm-mar-vert-4 eds-tex t-bm structured-content-rich-text">\n<div class="eds-text--left">\n<h3><st rong><em>Seminar (12:10 pm - 12:55 pm):</em></strong></h3>\n<h3><strong>At omic Layer Deposition of 2D Dichalcogenides at Wafer Scale</strong></h3>\n <p>2D Transition metal dichalcogenide (TMD) materials have opened a route to continue the down-scaling trend of semiconductor technology.</p>\n<p>Th e synthesis of conformal high quality 2D TMDs on 300 mm wafers is required to unlock the potential application of these materials in electronic devi ces. EMD Electronics is establishing a platform for TMD development using atomic layer deposition (ALD).</p>\n<p>The talk will be focusing on 300 mm wafer-scale ALD deposition of TMD materials at temperatures ranging from 350 to 600 &deg\;C. The proposed ALD approach contributes to the efforts i n developing high-quality 2D TMD materials that offer high performance and meet the down-scaling demand.</p>\n<p>In the past 3 years\, Thong and the EMD Electronics Team at San Jose have been developing an ALD 2D materials platform focusing on TMDs for high mobility channel and Cu barrier/liner applications</p>\n</div>\n</div>\n<div class="eds-l-mar-vert-6 eds-l-sm-ma r-vert-4 eds-text-bm undefined">\n<div>\n<div class="eds-fx--fade-in"><img class="eds-max-img" src="https://img.evbuc.com/https%3A%2F%2Fcdn.evbuc.co m%2Fimages%2F492500849%2F28237422945%2F1%2Foriginal.20230414-041649?h=2000 &amp\;w=720&amp\;auto=format%2Ccompress&amp\;q=75&amp\;sharp=10&amp\;s=860 55f9c5352433425985beaeca41aec" alt="" loading="lazy" /></div>\n</div>\n</d iv>\n<div class="eds-l-mar-vert-6 eds-l-sm-mar-vert-4 eds-text-bm undefine d">\n<div>\n<div class="eds-fx--fade-in"><img class="eds-max-img" src="htt ps://img.evbuc.com/https%3A%2F%2Fcdn.evbuc.com%2Fimages%2F492497809%2F2823 7422945%2F1%2Foriginal.20230414-040947?h=2000&amp\;w=720&amp\;auto=format% 2Ccompress&amp\;q=75&amp\;sharp=10&amp\;s=49593debfeac1360832a2a628673ebe9 " alt="" loading="lazy" /></div>\n</div>\n</div>\n<div class="eds-l-mar-ve rt-6 eds-l-sm-mar-vert-4 eds-text-bm structured-content-rich-text">\n<div class="eds-text--left">\n<p><strong>Dr. Thong Ngo&nbsp\;</strong>is an R&a mp\;D engineer at EMD Electronics.</p>\n<p>Thong finished his Ph.D. in Che mical Engineering from The University of Texas at Austin in 2015. His Ph.D . work explored functional crystalline oxides on Si and Ge for electronics using atomic layer deposition (ALD).</p>\n<p>Thong joined Intermolecular Inc.\, a subsidiary of EMD Electronics\, in 2015 where he has been working on materials process development\, characterization\, and integration for memory applications.</p>\n</div>\n</div>\n<div class="eds-l-mar-vert-6 ed s-l-sm-mar-vert-4 eds-text-bm structured-content-rich-text">\n<div class=" eds-text--left">\n<h3><strong>Hybrid Event</strong></h3>\n<p>This will be a&nbsp\;<strong>Hybrid Event {In-Person &amp\; Zoom linked]</strong></p>\n <p><strong><em>Those planning to attend in person should arrive early.&nbs p\;</em></strong>They will need to complete an electronic check-in before being admitted into Intermolecular.</p>\n<p>Enter the rear of the building from Orchard Parkway. You should park on the back side off of Orchard Par kway.</p>\n<p>If you will be unable to arrive in-person before the seminar starts - please plan on joining via Zoom</p>\n<p>All ticket registrants w ill be sent Zoom links before the event. Information will be sent to the e mail address entered when you register.</p>\n</div>\n</div>\n</div><br />< br />Agenda: <br /><div class="event-details__section-title">\n<h2>Agenda< /h2>\n</div>\n<div class="css-1u6j0vj eiwoi2i0" data-testid="agenda-compon ent">\n<div class="css-79elbk eiwoi2i3">\n<div class="css-12r38kx e1nkw0yb 0" data-testid="SlotPreview">\n<div class="css-8cghab e1nkw0yb2">\n<p clas s="css-xvzn5v e1nkw0yb3" data-testid="preview-slot__time">11:30 AM&nbsp\;- &nbsp\;12:00 PM</p>\n<p class="css-bh5t0l e1nkw0yb4"><strong>Nano Journal Club</strong></p>\n<div class="css-1hp63re e1nkw0yb5" data-testid="preview -slot__hosts-area">\n<div class="css-1b4fguo e1gn0wf40" data-testid="host- preview__wrapper">\n<p class="css-w1w60 e1gn0wf42">Lincoln Bourne</p>\n</d iv>\n</div>\n<hr class="css-13o51xp e1nkw0yb6" />\n<div class="css-18h30o5 e1nkw0yb7" data-testid="preview-slot__description">The following paper wi ll be discussed: "Challenges for Nanoscale CMOS Logic Based on 2D Material s"</div>\n</div>\n</div>\n<div class="css-1hcum5r e1nkw0yb0" data-testid=" SlotPreview">\n<div class="css-nlrmv2 e1nkw0yb2">\n<p class="css-xvzn5v e1 nkw0yb3" data-testid="preview-slot__time">12:00 PM&nbsp\;-&nbsp\;12:10 PM< /p>\n<p class="css-bh5t0l e1nkw0yb4"><strong>Introduction\; Announcements and Speaker Introduction</strong></p>\n<div class="css-1hp63re e1nkw0yb5" data-testid="preview-slot__hosts-area">\n<div class="css-1b4fguo e1gn0wf40 " data-testid="host-preview__wrapper">\n<p class="css-w1w60 e1gn0wf42">Gle nn Friedman</p>\n</div>\n</div>\n</div>\n</div>\n<div class="css-6pdkla e1 nkw0yb0" data-testid="SlotPreview">\n<div class="css-18vl9lm e1nkw0yb2">\n <p class="css-xvzn5v e1nkw0yb3" data-testid="preview-slot__time">12:10 PM& nbsp\;-&nbsp\;12:55 PM</p>\n<p class="css-bh5t0l e1nkw0yb4"><strong>Semina r</strong></p>\n<div class="css-1hp63re e1nkw0yb5" data-testid="preview-sl ot__hosts-area">\n<div class="css-1b4fguo e1gn0wf40" data-testid="host-pre view__wrapper">\n<p class="css-w1w60 e1gn0wf42">Thong Ngo</p>\n</div>\n</d iv>\n</div>\n</div>\n<div class="css-8hxyr6 e1nkw0yb0" data-testid="SlotPr eview">\n<div class="css-1dg3kds e1nkw0yb2">\n<p class="css-xvzn5v e1nkw0y b3" data-testid="preview-slot__time">12:55 PM&nbsp\;-&nbsp\;1:15 PM</p>\n< p class="css-bh5t0l e1nkw0yb4"><strong>Q &amp\; A</strong></p>\n</div>\n</ div>\n</div>\n</div> END:VEVENT END:VCALENDAR