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VERSION:2.0
PRODID:IEEE vTools.Events//EN
CALSCALE:GREGORIAN
BEGIN:VTIMEZONE
TZID:Asia/Tokyo
BEGIN:STANDARD
DTSTART:19510909T000000
TZOFFSETFROM:+1000
TZOFFSETTO:+0900
TZNAME:JST
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BEGIN:VEVENT
DTSTAMP:20230928T145213Z
UID:EED7B520-0035-48BA-A0F2-92C6779D5FDB
DTSTART;TZID=Asia/Tokyo:20230823T110000
DTEND;TZID=Asia/Tokyo:20230823T123500
DESCRIPTION:In this event\, we invite EDTM subcommittee members and report 
 the highlight papers and technical trends of EDTM 2023.\n(https://ewh.ieee
 .org/conf/edtm/2023/)\n\nCo-sponsored by: EDTM 2023 Committee\, IEEE EDS K
 ansai Chapter\n\nAgenda: \n11:00-11:02 Opening / Kazunari Ishimaru (Rapidu
 s)\n11:02-11:15 Overview / HItoshi Wakabayashi (Tokyo Institute of Technol
 ogy)\n11:15-11:30 Power and Energy Devices / Wataru Saito (Kyushu Universi
 ty)\n11:30-11:45 Process\, Tools\, Yield\, and Manufacturing / Makoto Miur
 a (Hitachi High-Technologies)\n11:45-12:00 Papers in Process\, Tools\, Yie
 ld\, and Manufacturing / Yoshiki Yamamoto (Renesas)\n12:00-12:15 Nanotechn
 ologies / Kim Myeongok (The University of Tokyo)\n12:15-12:30 Semiconducto
 r Devices / Kuniyuki Kakushima (Tokyo Institute of Technology)\n12:30-12:3
 5 Closing / Masumi Saitoh (KIOXIA)\n\nRoom: 7F 754\, Bldg: Ishikawadai Bld
 g. 1\, Tokyo Institute of Technologies\, Ookayama Campus\, 2-12-1\, Ookaya
 ma\, Meguro\, Tokyo\, Japan\, 152-8550\, Virtual: https://events.vtools.ie
 ee.org/m/375904
LOCATION:Room: 7F 754\, Bldg: Ishikawadai Bldg. 1\, Tokyo Institute of Tech
 nologies\, Ookayama Campus\, 2-12-1\, Ookayama\, Meguro\, Tokyo\, Japan\, 
 152-8550\, Virtual: https://events.vtools.ieee.org/m/375904
ORGANIZER:naoki.watanabe.bv@hitachi.com
SEQUENCE:38
SUMMARY:IEEE EDS\, 7th Electron Devices Technology and Manufacturing Confer
 ence (EDTM 2023) Report Session
URL;VALUE=URI:https://events.vtools.ieee.org/m/375904
X-ALT-DESC:Description: &lt;br /&gt;&lt;p&gt;In this event\, we invite EDTM subcommitte
 e members and report the highlight papers and technical trends of EDTM 202
 3.&lt;br /&gt;(&lt;a href=&quot;https://ewh.ieee.org/conf/edtm/2023/&quot; target=&quot;_blank&quot; re
 l=&quot;noopener&quot;&gt;https://ewh.ieee.org/conf/edtm/2023/&lt;/a&gt;)&lt;/p&gt;\n&lt;p&gt;&amp;nbsp\;&lt;/p&gt;
 \n&lt;p&gt;&amp;nbsp\;&lt;/p&gt;&lt;br /&gt;&lt;br /&gt;Agenda: &lt;br /&gt;&lt;p&gt;11:00-11:02 Opening / &lt;em&gt;Kaz
 unari Ishimaru (Rapidus)&lt;/em&gt;&lt;br /&gt;11:02-11:15 Overview / HItoshi Wa&lt;em&gt;ka
 bayashi (Tokyo Institute of Technology)&lt;/em&gt;&lt;br /&gt;11:15-11:30 Power and En
 ergy Devices / &lt;em&gt;Wataru Saito (Kyushu University)&lt;/em&gt;&lt;br /&gt;11:30-11:45 
 Process\, Tools\, Yield\, and Manufacturing / &lt;em&gt;Makoto Miura (Hitachi Hi
 gh-Technologies)&lt;br /&gt;&lt;/em&gt;11:45-12:00 Papers in Process\, Tools\, Yield\,
  and Manufacturing /&lt;em&gt; Yoshiki Yamamoto (Renesas)&lt;/em&gt;&lt;br /&gt;12:00-12:15 
 Nanotechnologies /&lt;em&gt; Kim Myeongok (The University of Tokyo)&lt;/em&gt;&lt;br /&gt;12
 :15-12:30 Semiconductor Devices / &lt;em&gt;Kuniyuki Kakushima (Tokyo Institute 
 of Technology)&lt;/em&gt;&lt;em&gt;&lt;br /&gt;&lt;/em&gt;12:30-12:35 Closing / &lt;em&gt;Masumi Saitoh 
 (KIOXIA)&lt;/em&gt;&lt;/p&gt;
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