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DTSTART:20240310T030000
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DTSTAMP:20240908T121638Z
UID:D418EF12-6DFD-4B46-9952-DF74EBC0C179
DTSTART;TZID=America/New_York:20240828T150000
DTEND;TZID=America/New_York:20240828T160000
DESCRIPTION:Welcome to the Fall 2024 Semester. The first MIPSE seminar of t
 he semester will be presented by Prof. Lado Filipovic of the Vienna Univer
 sity of Technology on Wednesday\, August 28 at 3:00 pm in Room 1018 Dow. I
 n his seminar\, titled “Multi-Scale Process TCAD at the Institute for Mi
 croelectronics\, TU Wien”\, Dr. Filipovic will describe the outcome of p
 lasma materials processing – the use of plasma generated fluxes to fabri
 cate microelectronics devices. Dr. Filipovic’s team has developed world 
 leading technology computer aided design (TCAD) tools that use plasma reac
 tor scale inputs to predict evolution of nm feature scale structures that 
 are utilized in process and circuit design. Please see attached flyer or [
 MIPSE website](https://urldefense.com/v3/__https://mipse.umich.edu/seminar
 s_2425.php__\;!!HXCxUKc!3Ai-D-bGLNsLu8df7e-bXCybOPuytBOceibcp6LLK3zclxw6I0
 fFYIRBflDh4HVtgW7ne3ToiU-xQVxD$) for details.\n\nThe seminar will be condu
 cted both in person and on Zoom.\nZoom meeting: [https://umich.zoom.us/j/9
 8163860657](https://urldefense.com/v3/__https://umich.zoom.us/j/9816386065
 7__\;!!HXCxUKc!3Ai-D-bGLNsLu8df7e-bXCybOPuytBOceibcp6LLK3zclxw6I0fFYIRBflD
 h4HVtgW7ne3ToiTHz6_VE$)\, passcode: MIPSE\n\nSpeaker(s): Prof. Lado Filipo
 vic\, \n\nRoom: Room 1018 Dow\, Ann Arbor\, Michigan\, United States\, 481
 09\, Virtual: https://events.vtools.ieee.org/m/431922
LOCATION:Room: Room 1018 Dow\, Ann Arbor\, Michigan\, United States\, 48109
 \, Virtual: https://events.vtools.ieee.org/m/431922
ORGANIZER:hipple@msu.edu
SEQUENCE:18
SUMMARY:Multi-Scale Process TCAD at the Institute for Microelectronics\, TU
  Wien
URL;VALUE=URI:https://events.vtools.ieee.org/m/431922
X-ALT-DESC:Description: <br /><p>&nbsp\;</p>\n<div>\n<div>\n<div>Welcome to
  the Fall 2024 Semester.&nbsp\; The first MIPSE seminar of the semester wi
 ll be presented by Prof. Lado Filipovic of the Vienna University of Techno
 logy on Wednesday\, August 28 at 3:00 pm in Room 1018 Dow.&nbsp\; In his s
 eminar\, titled &ldquo\;Multi-Scale Process TCAD at the Institute for Micr
 oelectronics\, TU Wien&rdquo\;\, Dr. Filipovic will describe the outcome o
 f plasma materials processing &ndash\; the use of plasma generated fluxes 
 to fabricate microelectronics devices. Dr. Filipovic&rsquo\;s team has dev
 eloped world leading technology computer aided design (TCAD) tools that us
 e plasma reactor scale inputs to predict evolution of nm feature scale str
 uctures that are utilized in process and circuit design. Please see attach
 ed flyer or&nbsp\;<a href="https://urldefense.com/v3/__https://mipse.umich
 .edu/seminars_2425.php__\;!!HXCxUKc!3Ai-D-bGLNsLu8df7e-bXCybOPuytBOceibcp6
 LLK3zclxw6I0fFYIRBflDh4HVtgW7ne3ToiU-xQVxD$" target="_blank" rel="noopener
  noreferrer" data-auth="NotApplicable" data-linkindex="0">MIPSE website</a
 >&nbsp\;for details.</div>\n<div>&nbsp\;</div>\n<div>The seminar will be c
 onducted both in person and on Zoom.</div>\n<div>Zoom meeting:&nbsp\;<a hr
 ef="https://urldefense.com/v3/__https://umich.zoom.us/j/98163860657__\;!!H
 XCxUKc!3Ai-D-bGLNsLu8df7e-bXCybOPuytBOceibcp6LLK3zclxw6I0fFYIRBflDh4HVtgW7
 ne3ToiTHz6_VE$" target="_blank" rel="noopener noreferrer" data-auth="NotAp
 plicable" data-linkindex="1">https://umich.zoom.us/j/98163860657</a>\, pas
 scode: MIPSE</div>\n</div>\n<div>&nbsp\;</div>\n</div>\n<p>&nbsp\;</p>
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