BEGIN:VCALENDAR VERSION:2.0 PRODID:IEEE vTools.Events//EN CALSCALE:GREGORIAN BEGIN:VTIMEZONE TZID:America/Los_Angeles BEGIN:DAYLIGHT DTSTART:20240310T030000 TZOFFSETFROM:-0800 TZOFFSETTO:-0700 RRULE:FREQ=YEARLY;BYDAY=2SU;BYMONTH=3 TZNAME:PDT END:DAYLIGHT BEGIN:STANDARD DTSTART:20241103T010000 TZOFFSETFROM:-0700 TZOFFSETTO:-0800 RRULE:FREQ=YEARLY;BYDAY=1SU;BYMONTH=11 TZNAME:PST END:STANDARD END:VTIMEZONE BEGIN:VEVENT DTSTAMP:20241130T230748Z UID:C2EC6733-53E0-463C-B83A-36F00B72EB6A DTSTART;TZID=America/Los_Angeles:20240925T113000 DTEND;TZID=America/Los_Angeles:20240925T130000 DESCRIPTION:Novel hard-mask materials for future semiconductor manufacturin g\n\nRapid prototyping of etch test structures for hard mask development u sing electron beam lithography\n\n[]\n\nAbstract:\n\nSemiconductor manufac turing depends on the development of new processes\, advanced patterning\, and novel materials to create smaller and higher performing devices to fo llow the industry roadmaps for applications for computing and systems (suc h as smartphones and servers).\n\nFor Dynamic Random Access Memory (DRAM) applications\, more innovation is needed to sustain the high aspect ratios required in the capacitor’s architecture - whether it is moving towards 3D architectures or developing new materials to sustain the challenge of scaling.\n\nTo accelerate the learning\, it is essential to screen novel h ard mask (HM) materials in a rapid fashion to speed their development.\n\n The primary goal of this work is to create a path for rapidly screening of HM materials which are still under early phase development\, and which ar e prepared in small chamber tools (coupon chambers) and therefore not read y for 300 mm process integration.\n\n[]\n\nBio:\n\nLuisa Bozano:\n\nDirect or of Patterning Engineering\, Applied Materials\n\nHer interests at the i nterface of physics\, material science and chemistry led her to pursue adv anced studies at UC Santa Cruz after receiving her Laurea degree in Physic s from the University of Genoa in her native Italy.\n\nWhile receiving her doctorate\, she joined IBM Almaden Research.\n\nHer work at IBM ranged fr om the application of metal oxides and polymers to sensors and electronics \, to development of resist materials and e-beam methods for improved opti cal mask lithography. Her leadership in these spaces yielded over 30 issue d patents\, and as impressively\, successful transfer and commercializatio n of patterning materials to external collaborators.\n\nLuisa now leads Ap plied Materials' interests in advanced patterning\, from e-beam to packagi ng\, as Director of Patterning Engineering.\n\nBldg: ==> Use corner entran ce: Kifer Road / San Lucar Court ==> Do not enter at main entrance on Kife r Road\, EAG Labs\, 810 Kifer Road\, Sunnyvale\, California\, California\, United States\, 95051 LOCATION:Bldg: ==> Use corner entrance: Kifer Road / San Lucar Court ==> Do not enter at main entrance on Kifer Road\, EAG Labs\, 810 Kifer Road\, Su nnyvale\, California\, California\, United States\, 95051 ORGANIZER:G.M.Friedman@ieee.org SEQUENCE:33 SUMMARY:Novel hard-mask materials for future semiconductor manufacturing URL;VALUE=URI:https://events.vtools.ieee.org/m/434339 X-ALT-DESC:Description: <br /><div class="eds-l-mar-vert-6 eds-l-sm-mar-ver t-4 eds-text-bm structured-content-rich-text">\n<div class="eds-text--left ">\n<h1 class="event-title css-0">Novel hard-mask materials for future sem iconductor manufacturing</h1>\n<h1><em><strong>Rapid prototyping of etch t est structures for hard mask development using electron beam lithography</ strong></em></h1>\n</div>\n</div>\n<div class="" data-testid="image-conten t">\n<div class="eds-l-mar-vert-6 eds-l-sm-mar-vert-4 eds-text-bm undefine d">\n<div>\n<div class="eds-fx--fade-in"><img class="eds-max-img" src="htt ps://events.vtools.ieee.org/vtools_ui/media/display/c39d0ea0-74fe-42b5-acd 5-f16fc92a303c" alt="" width="498" height="360" loading="lazy"></div>\n</d iv>\n</div>\n</div>\n<div class="eds-l-mar-vert-6 eds-l-sm-mar-vert-4 eds- text-bm structured-content-rich-text">\n<div class="eds-text--left">\n<p>& nbsp\;</p>\n<h3><strong>Abstract:</strong></h3>\n<h3>Semiconductor manufac turing depends on the development of new processes\, advanced patterning\, and novel materials to create smaller and higher performing devices to fo llow the industry roadmaps for applications for computing and systems (suc h as smartphones and servers).</h3>\n<h3>For Dynamic Random Access Memory (DRAM) applications\, more innovation is needed to sustain the high aspect ratios required in the capacitor&rsquo\;s architecture - whether it is mo ving towards 3D architectures or developing new materials to sustain the c hallenge of scaling.</h3>\n<h3>To accelerate the learning\, it is essentia l to screen novel hard mask (HM) materials in a rapid fashion to speed the ir development.</h3>\n<h3>The primary goal of this work is to create a pat h for rapidly screening of HM materials which are still under early phase development\, and which are prepared in small chamber tools (coupon chambe rs) and therefore not ready for 300 mm process integration.</h3>\n</div>\n </div>\n<div class="" data-testid="image-content">\n<div class="eds-l-mar- vert-6 eds-l-sm-mar-vert-4 eds-text-bm undefined">\n<div>\n<div class="eds -fx--fade-in"><img class="eds-max-img" src="https://events.vtools.ieee.org /vtools_ui/media/display/f82c828e-5a3d-43ff-8670-917a512c1171" alt="" widt h="597" height="336" loading="lazy"></div>\n</div>\n</div>\n</div>\n<div c lass="eds-l-mar-vert-6 eds-l-sm-mar-vert-4 eds-text-bm structured-content- rich-text">\n<div class="eds-text--left">\n<h3>Bio:</h3>\n<h3>Luisa Bozano :</h3>\n<h3>Director of Patterning Engineering\, Applied Materials</h3>\n< h3>Her interests at the interface of physics\, material science and chemis try led her to pursue advanced studies at UC Santa Cruz after receiving he r Laurea degree in Physics from the University of Genoa in her native Ital y.</h3>\n<h3>While receiving her doctorate\, she joined IBM Almaden Resear ch.</h3>\n<h3>Her work at IBM ranged from the application of metal oxides and polymers to sensors and electronics\, to development of resist materia ls and e-beam methods for improved optical mask lithography. Her leadershi p in these spaces yielded over 30 issued patents\, and as impressively\, s uccessful transfer and commercialization of patterning materials to extern al collaborators.</h3>\n<h3>Luisa now leads Applied Materials' interests i n advanced patterning\, from e-beam to packaging\, as Director of Patterni ng Engineering.</h3>\n</div>\n</div> END:VEVENT END:VCALENDAR