BEGIN:VCALENDAR VERSION:2.0 PRODID:IEEE vTools.Events//EN CALSCALE:GREGORIAN BEGIN:VTIMEZONE TZID:US/Eastern BEGIN:DAYLIGHT DTSTART:20170312T030000 TZOFFSETFROM:-0500 TZOFFSETTO:-0400 RRULE:FREQ=YEARLY;BYDAY=2SU;BYMONTH=3 TZNAME:EDT END:DAYLIGHT BEGIN:STANDARD DTSTART:20171105T010000 TZOFFSETFROM:-0400 TZOFFSETTO:-0500 RRULE:FREQ=YEARLY;BYDAY=1SU;BYMONTH=11 TZNAME:EST END:STANDARD END:VTIMEZONE BEGIN:VEVENT DTSTAMP:20170503T153550Z UID:DA28EEA8-251F-11E7-8752-0050568D2FB3 DTSTART;TZID=US/Eastern:20170503T190000 DTEND;TZID=US/Eastern:20170503T204500 DESCRIPTION:The various types of resistor technologies are covered includin g bulk metal foil\, thin film\, thick film and wire-wound\, along with the factors that must be considered in the selection process for a given circ uit application. Foil topology is then covered in more detail showing how stabilities of 0.2 to 2.0 ppm/K are readily achieved and the various packa ging options available. Some portions of the foil resistor manufacturing p rocess is examined to establish a better understanding of resistor modelin g. Parasitic inductance and capacitance of foil resistors is examined and compared to other resistor topologies.\n\nApplications explored include pr ecision current sensing and high-stability current mirroring\, which are s upplemented by live practical demonstrations that highlight the difference s of resistor technologies in terms of PCR\, TCR\, ESD\, short-term overlo ad and thermal EMF.\n\nSpeaker(s): Bill Demers\, \, Bill Demers\, \n\nAgen da: \n6:00-6:30 PM - Registration\, Pizza and Networking\n\n6:30-6:35 PM - Introduction\n\n6:35-7:50 PM - Lecture with live demonstartions\n\n815 Br oad Hollow\, Farmingdale\, New York\, United States\, 11735 LOCATION:815 Broad Hollow\, Farmingdale\, New York\, United States\, 11735 ORGANIZER:cas@ieee.li SEQUENCE:3 SUMMARY:Ultra High Precision Resistors URL;VALUE=URI:https://events.vtools.ieee.org/m/45157 X-ALT-DESC:Description: <br /><p>The various types of resistor technologies are covered including bulk metal foil\, thin film\, thick film and wire-w ound\, along with the factors that must be considered in the selection pro cess for a given circuit application. Foil topology is then covered in mor e detail showing how stabilities of 0.2 to 2.0 ppm/K are readily achieved and the various packaging options available. Some portions of the foil res istor manufacturing process is examined to establish a better understandin g of resistor modeling. Parasitic inductance and capacitance of foil resis tors is examined and compared to other resistor topologies.</p>\n<p>Applic ations explored include precision current sensing and high-stability curre nt mirroring\, which are supplemented by live practical demonstrations tha t highlight the differences of resistor technologies in terms of PCR\, TCR \, ESD\, short-term overload and thermal EMF.</p><br /><br />Agenda: <br / ><p>6:00-6:30 PM - Registration\, Pizza and Networking</p>\n<p>6:30-6:35 P M - Introduction</p>\n<p>6:35-7:50 PM - Lecture with live demonstartions</ p> END:VEVENT END:VCALENDAR