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BEGIN:VEVENT
DTSTAMP:20250422T211204Z
UID:35CFF5E8-381F-425D-BA7C-53E2F2E5C668
DTSTART;TZID=America/New_York:20250414T173000
DTEND;TZID=America/New_York:20250415T200000
DESCRIPTION:[Click Here to Register Now!](https://events.vtools.ieee.org/ev
 ent/register/474822)\n\nThis conference brings together students\, faculty
 \, alumni\, friends and industry guests interested in Microelectronic Engi
 neering. Key elements of the conference are: technical presentations by se
 niors on their capstone research and design projects\, industry and alumni
  presentations\, recognition of companies who have supported the program\,
  review of program activities and achievements over the past year and indu
 stry feedback on student and academic program activities.\n\nThe event beg
 ins on Monday evening with a reception and dinner at the RIT Inn &amp; Confere
 nce Center. The reception starts at 5:30pm\, with dinner at 6:30pm and spe
 akers to follow.\n\n[Off-campus map - RIT Inn &amp; Conference Center](https:/
 /maps.rit.edu/?details=RIT+Inn+&amp;+Conference+Center)\n\nThe technical sessi
 on is on Tuesday from 8am - 4pm in the Center for Integrated Manufacturing
  (CIMS\, SLA/078).\n\n[Campus map - CIMS Conference Center](https://maps.r
 it.edu/?details=CIMS+Conference+Center)\n\nRegistration is required (no ch
 arge) to determine meal orders.\n\nSpeaker(s): David Coumou \, Carlos Fons
 eca\, Robert Pearson\, Mark Indovina\, Daniel Morvay\n\nAgenda: \nMonday A
 pril 14\, 2025\n\n5:30 p.m. Reception at the RIT Inn and Conference Center
 \n\nDinner Agenda\n\n6:30 p.m. Dinner Begins\n\n7:00 p.m. Program Begins\n
 \nWelcome by Dr. Karl Hirschman\, Micron Professor\, Microelectronic Engin
 eering Program Director\n\n“Microelectronic Engineering – The Year in 
 Review”\, Dr. Robert Pearson\, Past Director of the Microelectronic Engi
 neering Program\n\nAwards:\n\nDr. Renan Turkman Scholarship Award Announce
 ment\n\nDr. Lynn Fuller Scholarship Award Announcement\n\nClosing Remarks:
  Dr. Karl Hirschman\n\nTuesday April 15\, 2025\n\n8:00 – 8:30 a.m. Regis
 tration CIMS\n\nTechnical Program Agenda\n\nMorning Session AM-1\n\nSessio
 n Chair:  Dr. Robert Pearson\, Associate Professor\n\n8:30 a.m. Welcome: K
 arl Hirschman\, Microelectronic Engineering Program Director\n\n8:35 a.m. 
 Opening Remarks: Ferat Sahin\, Department Head\, Electrical and Microelect
 ronic Engineering\, RIT\n\n8:40 a.m. “Plasma Science and Engineering for
  Semiconductor Processing“\, David Coumou (RIT BSEE ’92\, MSEE ‘01)\
 , Managing Director\,\nCore R&amp;D at Applied Materials (AMAT)\n\n9:10 a.m. S
 -1 “Reactive Sputtering of Aluminum Scandium Nitride”\, Ryan Allen\, S
 enior MicroE ‘25\n\n9:30 am S-2 “Titanium Nitride Process Development 
 for Gate Electrode in Thin Film Transistors”\, Kyle Legg\, Senior MicroE
  ‘25\n\n9:50 a.m. BREAK and Posters\n\nMorning Session AM-2\n\nSession C
 hair:  Dr. Karl Hirschman\, Micron Professor\n\n10:20 a.m. &quot;The Role of 
 “Digital” in Semiconductor Manufacturing Equipment Applications&quot;\, Car
 los Fonseca (RIT MicroE BS ’99)\,\nSenior Director\, Technology at Tokyo
  Electron (TEL)\n\n10:50 a.m. S-3 “Silicon Carbide Device and Process De
 sign at RIT”\, Abby Mizgala\, Senior MicroE ‘25\n\n11:10 a.m. S-4 “S
 implifying Micro-Transfer Printing (µTP): Single-Step Coupon Release Via 
 Metal-Assisted Chemical Etching (MacEtch)”\,\nSteven Johnston\, Senior M
 icroE ‘25\n\n11:30 a.m. “Curricula\, Course\, Labs and Software for Ma
 ximum Manufacturing Experience“\, Robert Pearson\, Associate Professor\,
 \nElectrical and Microelectronic Engineering\, RIT\n\n12:00 p.m. LUNCH\n\n
 Afternoon Session PM-1\n\nSession Chair: Sean Rommel\, Professor\n\n1:00 p
 .m. “The VLSI Design Experience”\, Mark Indovina (RIT BSEE ’82\, MSE
 E ’87)\, Senior Lecturer\, RIT Electrical and\nMicroelectronic Engineeri
 ng\n\n1:30 p.m. S-5 &quot; Investigation of Carry-Select Adder Low Power Archit
 ectures”\, Adheesh Ankolekar\, Senior MicroE ‘25\n\n1:50 p.m. S-6 &quot;Cad
 ence Layout and Simulation of an 8-bit 16-Instruction RISC”\, Josh Alper
 t\, Senior MicroE ‘25\n\n2:10 p.m. BREAK and Posters\n\nAfternoon Sessio
 n PM-2\n\nSession Chair: Michael Jackson\, Associate Professor\n\n2:50 p.m
 . “Overview of the “UPWARDS for the Future” Program\, Parsian K. Moh
 seni\, Associate Professor\, Department of Electrical and\nMicroelectronic
  Engineering\n\n3:00 p.m.  &quot;Real Cost of Compute: From Edge to Quantum&quot;\, 
 Daniel Morvay (RIT MicroE BS ’91)\, Principal Research Scientist\, AI &amp; 
 Big Data\nLeader at Tokyo Electron (TEL)\n\n3:30 p.m. &quot;Improving the Perfo
 rmance Variation for Graphene-Based Field-Effect Transistor”\, Andrew Sp
 encer\, Senior MicroE ‘25\n\n3:50 p.m. Technical Session Closing Remarks
  - Dr. Karl Hirschman\n\n4PM Conference Adjourn – see you in 2026!\n\nRo
 om: 2210 - 2240\, Bldg: CIMS / Slaughter Hall  SLA/078 (campus map)\, Roch
 ester Institute of Technology\, One Lomb Memorial Drive\, Rochester\, New 
 York\, United States\, 14623
LOCATION:Room: 2210 - 2240\, Bldg: CIMS / Slaughter Hall  SLA/078 (campus m
 ap)\, Rochester Institute of Technology\, One Lomb Memorial Drive\, Roches
 ter\, New York\, United States\, 14623
ORGANIZER:kdhemc@rit.edu
SEQUENCE:136
SUMMARY:43rd Annual Microelectronic Engineering Conference at RIT
URL;VALUE=URI:https://events.vtools.ieee.org/m/474822
X-ALT-DESC:Description: &lt;br /&gt;&lt;p&gt;&lt;span style=&quot;font-size: 18pt\; color: #000
 000\; background-color: #bfedd2\;&quot;&gt;&lt;strong&gt;&lt;a style=&quot;color: #000000\; back
 ground-color: #bfedd2\;&quot; href=&quot;https://events.vtools.ieee.org/event/regist
 er/474822&quot;&gt;Click Here to Register Now!&lt;/a&gt;&lt;/strong&gt;&lt;/span&gt;&lt;/p&gt;\n&lt;p&gt;This co
 nference brings together students\, faculty\, alumni\, friends and industr
 y guests interested in Microelectronic Engineering. Key elements of the co
 nference are: technical presentations by seniors on their capstone researc
 h and design projects\, industry and alumni presentations\, recognition of
  companies who have supported the program\, review of program activities a
 nd achievements over the past year and industry feedback on student and ac
 ademic program activities.&lt;/p&gt;\n&lt;p&gt;The event begins on Monday evening with
  a reception and dinner at the RIT Inn &amp;amp\; Conference Center.&amp;nbsp\; Th
 e reception starts at 5:30pm\, with dinner at 6:30pm and speakers to follo
 w.&amp;nbsp\;&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;&lt;span style=&quot;color: rgb(132\, 63\, 161)\;&quot;&gt;&lt;a st
 yle=&quot;color: rgb(132\, 63\, 161)\;&quot; title=&quot;RIT Inn &amp;amp\; Conference Center
  &quot; href=&quot;https://maps.rit.edu/?details=RIT+Inn+&amp;amp\;+Conference+Center&quot;&gt;O
 ff-campus map - RIT Inn &amp;amp\; Conference Center&lt;/a&gt;&lt;/span&gt;&lt;/strong&gt;&lt;/p&gt;\n
 &lt;p&gt;The technical session is on Tuesday from 8am - 4pm in the Center for In
 tegrated Manufacturing (CIMS\, SLA/078).&amp;nbsp\;&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;&lt;span styl
 e=&quot;color: rgb(132\, 63\, 161)\;&quot;&gt;&lt;a style=&quot;color: rgb(132\, 63\, 161)\;&quot; h
 ref=&quot;https://maps.rit.edu/?details=CIMS+Conference+Center&quot;&gt;Campus map - CI
 MS Conference Center&lt;/a&gt;&lt;/span&gt;&lt;/strong&gt;&lt;/p&gt;\n&lt;p&gt;Registration is required 
 (no charge) to determine meal orders.&amp;nbsp\;&amp;nbsp\;&lt;/p&gt;&lt;br /&gt;&lt;br /&gt;Agenda:
  &lt;br /&gt;&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;span style=&quot;font-size: 14pt\;&quot;&gt;&lt;strong&gt;Mon
 day April 14\, 2025&lt;/strong&gt;&lt;/span&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;5
 :30 p.m. Reception at the RIT Inn and Conference Center&lt;/strong&gt;&lt;/p&gt;\n&lt;p c
 lass=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Dinner Ag
 enda&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;6:30 p.m. Dinner Begins&lt;/p&gt;\n&lt;p
  class=&quot;MsoPlainText&quot;&gt;7:00 p.m. Program Begins&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText
 &quot;&gt;Welcome by Dr. Karl Hirschman\, Micron Professor\, Microelectronic Engin
 eering Program Director&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;ldquo\;Microelectron
 ic Engineering &amp;ndash\; The Year in Review&amp;rdquo\;\, Dr. Robert Pearson\, 
 Past Director of the Microelectronic Engineering Program&lt;/p&gt;\n&lt;p class=&quot;Ms
 oPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Awards:&lt;/strong&gt;&lt;
 /p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;Dr. Renan Turkman Scholarship Award Announcem
 ent&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;Dr. Lynn Fuller Scholarship Award Announc
 ement&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;s
 trong&gt;Closing Remarks:&lt;/strong&gt; Dr. Karl Hirschman&lt;/p&gt;\n&lt;p class=&quot;MsoPlain
 Text&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlain
 Text&quot;&gt;&lt;span style=&quot;font-size: 14pt\;&quot;&gt;&lt;strong&gt;Tuesday April 15\, 2025&lt;/str
 ong&gt;&lt;/span&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;8:00 &amp;ndash\; 8:30 a.m. R
 egistration CIMS&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p cla
 ss=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Technical Program Agenda&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=
 &quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Morning Sessio
 n AM-1&amp;nbsp\;&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Session Chair:
 &amp;nbsp\;&lt;/strong&gt; Dr. Robert Pearson\, Associate Professor&lt;/p&gt;\n&lt;p class=&quot;M
 soPlainText&quot;&gt;8:30 a.m. &amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; Welcome:
 &amp;nbsp\; Karl Hirschman\, Microelectronic Engineering Program Director&lt;/p&gt;\
 n&lt;p class=&quot;MsoPlainText&quot;&gt;8:35 a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp
 \;&amp;nbsp\; Opening Remarks:&amp;nbsp\; Ferat Sahin\, Department Head\, Electric
 al and Microelectronic Engineering\, RIT&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;8:40
  a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; &amp;ldquo\;Plasma Scie
 nce and Engineering for Semiconductor Processing&amp;ldquo\;\, David Coumou (R
 IT BSEE &amp;rsquo\;92\, MSEE &amp;lsquo\;01)\, Managing Director\, &lt;br&gt;&amp;nbsp\; &amp;n
 bsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbs
 p\; &amp;nbsp\;Core R&amp;amp\;D at Applied Materials (AMAT)&amp;nbsp\;&lt;/p&gt;\n&lt;p class=
 &quot;MsoPlainText&quot;&gt;9:10 a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; 
 S-1 &amp;ldquo\;Reactive Sputtering of Aluminum Scandium Nitride&amp;rdquo\;\, &amp;nb
 sp\;Ryan Allen\, Senior MicroE &amp;lsquo\;25&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainTe
 xt&quot;&gt;9:30 am&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;
  S-2 &amp;ldquo\;Titanium Nitride Process Development for Gate Electrode in Th
 in Film Transistors&amp;rdquo\;\, Kyle Legg\, Senior MicroE &amp;lsquo\;25 &amp;nbsp\;
  &amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;
 &gt;&lt;strong&gt;9:50 a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; BREAK 
 and Posters&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;M
 soPlainText&quot;&gt;&lt;strong&gt;Morning Session AM-2&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlain
 Text&quot;&gt;&lt;strong&gt;Session Chair: &lt;/strong&gt;&amp;nbsp\;Dr. Karl Hirschman\, Micron P
 rofessor&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;10:20 a.m.&amp;nbsp\; &amp;nbsp\; &amp;nbsp\;&quot;Th
 e Role of &amp;ldquo\;Digital&amp;rdquo\; in Semiconductor Manufacturing Equipment
  Applications&quot;\, Carlos Fonseca (RIT MicroE BS &amp;rsquo\;99)\, &lt;br&gt;&amp;nbsp\; &amp;
 nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nb
 sp\; Senior Director\, Technology at Tokyo Electron (TEL)&lt;/p&gt;\n&lt;p class=&quot;M
 soPlainText&quot;&gt;10:50 a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; S-3 &amp;ldquo\;Silicon Ca
 rbide Device and Process Design at RIT&amp;rdquo\;\, Abby Mizgala\, Senior Mic
 roE &amp;lsquo\;25&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;11:10 a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\
 ;&amp;nbsp\; S-4 &amp;ldquo\;Simplifying Micro-Transfer Printing (&amp;micro\;TP): Sin
 gle-Step Coupon Release Via Metal-Assisted Chemical Etching (MacEtch)&amp;rdqu
 o\;\, &lt;br&gt;&amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; 
 &amp;nbsp\; &amp;nbsp\; &amp;nbsp\;Steven Johnston\, Senior MicroE &amp;lsquo\;25&amp;nbsp\;&lt;/
 p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;11:30 a.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; &amp;ldquo\
 ;&lt;span style=&quot;font-size: 12.0pt\; line-height: 107%\; font-family: &#39;Arial&#39;
 \,sans-serif\; mso-fareast-font-family: &#39;Times New Roman&#39;\; color: #212529
 \; mso-ansi-language: EN-US\; mso-fareast-language: EN-US\; mso-bidi-langu
 age: AR-SA\;&quot;&gt;Curricula\, Course\, Labs and Software for Maximum Manufactu
 ring Experience&lt;/span&gt;&amp;ldquo\;\, Robert Pearson\, Associate Professor\, &lt;b
 r&gt;&amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; 
 &amp;nbsp\; &amp;nbsp\;Electrical and Microelectronic Engineering\, RIT&lt;/p&gt;\n&lt;p cl
 ass=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;12:00 p.m.
  &amp;nbsp\;&amp;nbsp\;&amp;nbsp\; LUNCH&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;
 &lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Afternoon Session PM-1&lt;/strong&gt;&lt;/p&gt;\
 n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Session Chair: &lt;/strong&gt;Sean Rommel\, Pro
 fessor&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;1:00 p.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;
 nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; &amp;ldquo\;The VLSI Design Experience&amp;rdquo\;\, M
 ark Indovina (RIT BSEE &amp;rsquo\;82\, MSEE &amp;rsquo\;87)\, Senior Lecturer\, R
 IT Electrical and &lt;br&gt;&amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbs
 p\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; Microelectronic Engineering &amp;n
 bsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;1:30 p.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;n
 bsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; S-5 &quot; Investigation of Carry-Select Adder Low P
 ower Architectures&amp;rdquo\;\, &amp;nbsp\;Adheesh Ankolekar\, Senior MicroE &amp;lsq
 uo\;25 &amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;1:50 p.m. &amp;nbsp\;&amp;nbsp\;&amp;nbsp\
 ;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; S-6 &quot;Cadence Layout and Simulation of an 8-b
 it 16-Instruction RISC&amp;rdquo\;\, &amp;nbsp\;Josh Alpert\, Senior MicroE &amp;lsquo
 \;25&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainTe
 xt&quot;&gt;&lt;strong&gt;2:10 p.m. &amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\; BR
 EAK and Posters&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p clas
 s=&quot;MsoPlainText&quot;&gt;&lt;strong&gt;Afternoon Session PM-2&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;Ms
 oPlainText&quot;&gt;&lt;strong&gt;Session Chair:&lt;/strong&gt; Michael Jackson\, Associate Pr
 ofessor&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;2:50 p.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;
 &amp;nbsp\;&amp;nbsp\;&amp;nbsp\; &amp;ldquo\;Overview of the &amp;ldquo\;UPWARDS for the Futu
 re&amp;rdquo\; Program\, &amp;nbsp\;Parsian K. Mohseni\, Associate Professor\, Dep
 artment of Electrical and &lt;br&gt;&amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbs
 p\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\;Microelectronic Enginee
 ring &amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;span style=&quot;font-size: 12pt\;&quot;&gt;
 3:00 p.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&lt;span style=&quot;fon
 t-family: arial\, helvetica\, sans-serif\;&quot;&gt;&lt;span style=&quot;font-size: 12pt\;
 &quot;&gt; &quot;Real Cost of Compute: &amp;nbsp\;From Edge to Quantum&quot;&lt;/span&gt;\,&lt;/span&gt; Dan
 iel Morvay&lt;/span&gt; (RIT MicroE BS &amp;rsquo\;91)\, Principal Research Scientis
 t\, AI &amp;amp\; Big Data &lt;br&gt;&amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\;
  &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\;Leader at Tokyo Electron (
 TEL)&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;3:30 p.m. &amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;n
 bsp\;&amp;nbsp\;&amp;nbsp\;&quot;Improving the Performance Variation for Graphene-Based
  Field-Effect Transistor&amp;rdquo\;\, Andrew Spencer\, Senior MicroE &amp;lsquo\;
 25&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;3:50 p.m.&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp\;&amp;nbsp
 \;&amp;nbsp\;&amp;nbsp\; Technical Session Closing Remarks - Dr. Karl Hirschman&lt;/p
 &gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&amp;nbsp\;&lt;/p&gt;\n&lt;p class=&quot;MsoPlainText&quot;&gt;&lt;span styl
 e=&quot;font-size: 14pt\;&quot;&gt;&lt;strong&gt;4PM Conference Adjourn &amp;ndash\; see you in 2
 026!&lt;/strong&gt;&lt;/span&gt;&lt;/p&gt;
END:VEVENT
END:VCALENDAR