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PRODID:IEEE vTools.Events//EN
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TZID:Europe/Brussels
BEGIN:DAYLIGHT
DTSTART:20250330T030000
TZOFFSETFROM:+0100
TZOFFSETTO:+0200
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DTSTART:20251026T020000
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BEGIN:VEVENT
DTSTAMP:20250622T150821Z
UID:5B4B7768-DB98-4801-BE0B-E845C976F80C
DTSTART;TZID=Europe/Brussels:20250619T123000
DTEND;TZID=Europe/Brussels:20250619T160000
DESCRIPTION:Program:\n\n12.30-13.30 welcome\n\n13.30-14.00 Device architect
 ure changes: planar->FinFETs -> Nanosheets -> CFET: Devin Verreck\n\n14.00
 -14.30 Evolution of lithography for logic scaling from 248nm to highNA EUV
 : Kurt Ronse\, Progam Director\n\n14.30-15.00 DTCO and STCO: Fernando Garc
 ia\, Principal Member of Technical Staff\n\n15.00-15.30 Packaging and Syst
 em Integration Readiness for Mobile genAI by Joshua A. H. Klein\, Research
 er SID\n\n15.30-16.00 visit to the cleanroom\n\nBldg: Imec Tower\, Remiseb
 osweg 1 \, Heveree\, Vlaams Brabant\, Belgium\, 3001
LOCATION:Bldg: Imec Tower\, Remisebosweg 1 \, Heveree\, Vlaams Brabant\, Be
 lgium\, 3001
ORGANIZER:kvtklooster@gmail.com
SEQUENCE:13
SUMMARY:IEEE Benelux Section LMAG: Visit to IMEC (B)
URL;VALUE=URI:https://events.vtools.ieee.org/m/475025
X-ALT-DESC:Description: <br /><p>Program:</p>\n<p>12.30-13.30 welcome&nbsp\
 ;</p>\n<p>13.30-14.00 Device architecture changes: planar-&gt\;FinFETs -&g
 t\; Nanosheets -&gt\; CFET: Devin Verreck</p>\n<p>14.00-14.30 Evolution of
  lithography for logic scaling from 248nm to highNA EUV: Kurt Ronse\, Prog
 am Director</p>\n<p>14.30-15.00 DTCO and STCO: Fernando Garcia\, Principal
  Member of Technical Staff</p>\n<p>15.00-15.30 Packaging and System Integr
 ation Readiness for Mobile genAI by Joshua A. H. Klein\, Researcher SID</p
 >\n<p>15.30-16.00 visit to the cleanroom</p>
END:VEVENT
END:VCALENDAR