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DTSTART:20250309T030000
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DTSTART:20251102T010000
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DTSTAMP:20250419T210642Z
UID:6C5DABD2-A930-4970-8903-413C4EA8150E
DTSTART;TZID=America/New_York:20250416T151000
DTEND;TZID=America/New_York:20250416T164500
DESCRIPTION:Dear MIPSE Visitors and Friends\,\n\nOur final MIPSE seminar of
  the semester will be given by Dr. Benjamin Yee and Dr. Hema Swaroop Mopid
 evi of Lam Research Corp. The seminar\, to be presented on Wednesday\, Apr
 il 16\, at 3:10 pm in room 1003 EECS\, is titled “Grand Challenges in RF
  &amp; Plasmas for Next Generation Semiconductor Manufacturing”. In this tal
 k\, an overview of the role of plasma processing for etching and depositio
 n in semiconductor manufacturing will be given\, with emphasis on the stat
 e-of-the-art challenges in fabricating advanced microelectronics and quant
 um devices. The importance of RF (radio frequency) power delivery to susta
 in these plasmas\, often pulsed power\, will also be discussed.\n\nPlease 
 see attached flyer or [MIPSE website](https://mipse.umich.edu/seminars_242
 5.php) for details.\nThe seminar will be conducted in person and simulcast
  via Zoom (see [login instructions](https://mipse.umich.edu/seminars_2425.
 php#winter2025) on the MIPSE website).\n\nAgenda: \nWelcome: 3:10 PM\n\nPr
 esentation:\n\nQ&amp;A\n\nClosing\n\nVirtual: https://events.vtools.ieee.org/m
 /480867
LOCATION:Virtual: https://events.vtools.ieee.org/m/480867
ORGANIZER:k.williams@ieee.org
SEQUENCE:62
SUMMARY:Plasma processing for etching and deposition in semiconductor manuf
 acturing.
URL;VALUE=URI:https://events.vtools.ieee.org/m/480867
X-ALT-DESC:Description: &lt;br /&gt;&lt;p&gt;&lt;span style=&quot;font-size: 18pt\;&quot;&gt;&lt;strong&gt;De
 ar MIPSE Visitors and Friends\,&lt;/strong&gt;&lt;span class=&quot;im&quot;&gt;&lt;br&gt;&lt;br&gt;Our final
  MIPSE seminar of the semester will be given by Dr. Benjamin Yee and Dr. H
 ema Swaroop Mopidevi of Lam Research Corp. The seminar\, to be presented o
 n Wednesday\, April 16\, at 3:10 pm in room 1003 EECS\, is titled &amp;ldquo\;
 Grand Challenges in RF &amp;amp\; Plasmas for Next Generation Semiconductor Ma
 nufacturing&amp;rdquo\;. In this talk\, an overview of the role of plasma proc
 essing for etching and deposition in semiconductor manufacturing will be g
 iven\, with emphasis on the state-of-the-art challenges in fabricating adv
 anced microelectronics and quantum devices. The importance of RF (radio fr
 equency) power delivery to sustain these plasmas\, often pulsed power\, wi
 ll also be discussed.&amp;nbsp\;&lt;/span&gt;&lt;/span&gt;&lt;/p&gt;\n&lt;p&gt;&lt;span style=&quot;font-size:
  18pt\;&quot;&gt;&lt;span class=&quot;im&quot;&gt;Please see attached flyer or&amp;nbsp\;&lt;a href=&quot;http
 s://mipse.umich.edu/seminars_2425.php&quot; target=&quot;_blank&quot; rel=&quot;noopener&quot; data
 -saferedirecturl=&quot;https://www.google.com/url?q=https://mipse.umich.edu/sem
 inars_2425.php&amp;amp\;source=gmail&amp;amp\;ust=1743513753209000&amp;amp\;usg=AOvVaw
 1d1Xaz2ZVs2u1TsW1WWe4_&quot;&gt;&lt;strong&gt;MIPSE&lt;/strong&gt;&amp;nbsp\;website&lt;/a&gt;&amp;nbsp\;for
  details. &amp;nbsp\;&lt;br&gt;The seminar will be conducted in person and simulcast
  via Zoom (see&amp;nbsp\;&lt;strong&gt;&lt;a href=&quot;https://mipse.umich.edu/seminars_242
 5.php#winter2025&quot; target=&quot;_blank&quot; rel=&quot;noopener&quot; data-saferedirecturl=&quot;htt
 ps://www.google.com/url?q=https://mipse.umich.edu/seminars_2425.php%23wint
 er2025&amp;amp\;source=gmail&amp;amp\;ust=1743513753209000&amp;amp\;usg=AOvVaw1KJA4eLq
 bC3GbNAaP53Fyy&quot;&gt;login instructions&lt;/a&gt;&lt;/strong&gt; on the MIPSE website).&amp;nbs
 p\;&lt;/span&gt;&lt;/span&gt;&lt;/p&gt;&lt;br /&gt;&lt;br /&gt;Agenda: &lt;br /&gt;&lt;p&gt;Welcome: 3:10 PM&lt;/p&gt;\n&lt;p
 &gt;Presentation:&lt;/p&gt;\n&lt;p&gt;Q&amp;amp\;A&lt;/p&gt;\n&lt;p&gt;Closing&lt;/p&gt;\n&lt;p&gt;&lt;img src=&quot;https://
 events.vtools.ieee.org/vtools_ui/media/display/1b23e3f8-cb4f-4429-b27e-112
 28fd65b9d&quot; width=&quot;770&quot; height=&quot;712&quot;&gt;&lt;/p&gt;
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