BEGIN:VCALENDAR VERSION:2.0 PRODID:IEEE vTools.Events//EN CALSCALE:GREGORIAN BEGIN:VTIMEZONE TZID:America/New_York BEGIN:DAYLIGHT DTSTART:20260308T030000 TZOFFSETFROM:-0500 TZOFFSETTO:-0400 RRULE:FREQ=YEARLY;BYDAY=2SU;BYMONTH=3 TZNAME:EDT END:DAYLIGHT BEGIN:STANDARD DTSTART:20261101T010000 TZOFFSETFROM:-0400 TZOFFSETTO:-0500 RRULE:FREQ=YEARLY;BYDAY=1SU;BYMONTH=11 TZNAME:EST END:STANDARD END:VTIMEZONE BEGIN:VEVENT DTSTAMP:20260412T105337Z UID:4360DA16-DC17-4A2F-B8B0-B759000B426D DTSTART;TZID=America/New_York:20260413T140000 DTEND;TZID=America/New_York:20260414T170000 DESCRIPTION:[Click Here to Register Now! Full Conference Agenda Below!](htt ps://events.vtools.ieee.org/event/register/549722)\n\nThis conference brin gs together students\, faculty\, alumni\, friends and industry guests inte rested in Microelectronic Engineering. Key elements of the conference are: technical presentations by seniors on their capstone research and design projects\, industry and alumni presentations\, recognition of companies wh o have supported the program\, review of program activities and achievemen ts over the past year and industry feedback on student and academic progra m activities.\n\nThe event begins at 2PM on Monday\, 3/13 at the RIT Inn & Conference Center with an industrial program review\; all company represe ntatives are welcome and encouraged to attend. The seniors will be showcas ing their research projects at the poster session reception at 4PM\, follo wed by a dinner program at 5:30PM. All conference speakers\, faculty\, Mic roelectronic Engineering seniors and graduate students\, and members from industry are invited.\n\n[Off-campus map - RIT Inn & Conference Center](ht tps://maps.rit.edu/?details=RIT+Inn+&+Conference+Center)\n\nThe technical session is on Tuesday\, 3/14 from 8AM - 4:30PM in the Center for Integrate d Manufacturing (CIMS\, SLA/078). Student talks and invited speakers are i n morning and afternoon sessions\, divided by a noon lunch catered by Dino saur BBQ!\n\n[Campus map - CIMS Conference Center](https://maps.rit.edu/?d etails=CIMS+Conference+Center)\n\nRegistration is required (no charge) to determine meal orders.\n\nSpeaker(s): Bryan Kasprowicz\, Patrick Naulleau\ , Robert Mulfinger\, Melinda Murdock\n\nAgenda: \nMonday April 13\, 2026\n RIT Inn and Conference Center\nhttps://www.mapquest.com/us/new-york/rit-in n-conference-center-1825291\n\n2:00 pm     Industrial Affiliates Meeting – Program Review and Future Directions\n\n4:00 pm      Reception and Poster Session\n(for Industrial Affiliates\, Conference S peakers\, Faculty\, MicroE Seniors and Graduate Students)\n\nEvening Progr am\n\n5:30 pm  Dinner Begins\n\n6:30 pm    Welcome\, Invited Speak er\, Awards\n\nInvited Talk: “Designing Talent\, Manufacturing the Futur e” by Mindy Murdock\, University Program Director\, INTEL\n\n8:00 pm Clo sing Remarks\n\nTuesday April 14\, 2026\nLouise Slaughter Hall (SLA /build ing 78)\, Rooms 2210-2240\nhttps://maps.rit.edu/details/46\n\n8:00 – 8:3 0 a.m. Registration\n\nMorning Session AM-1\n\nSession Chair: Dr. Robert P earson\, Professor Emeritus in MicroE\, RIT\n\n8:30 a.m. Welcome: Karl Hir schman\, Microelectronic Engineering Program Director\n\n8:35 a.m. Opening Remarks: Ferat Sahin\, Department Head Electrical and Microelectronic Eng ineering\, RIT\n\n8:40 a.m. Invited Talk: “Holistic Look at the Developm ent of Next Generation EUV Mask Blanks”\, Bryan Kasprowicz\, Sr. Directo r\, Technical Strategy at HOYA Corporation\, IT Segment Company\n\n9:10 a. m. “Fabrication of Vertical GaN FinFETs”\, Jason Lonneville\, BS Micro E ‘26\n\n9:25 a.m. “Measuring Dynamic Conduction and Coss Losses in Ga N FETs”\, Noah Donner\, BS MicroE ‘26\n\n9:40 a.m. “Etch Investigati on of Materials and Selectivity to Support Double Patterning Workflow”\, Jade Devilliers\, BS MicroE ‘26\n\n9:55 a.m. “Self-Alignment Using Mo nolayer Doping”\, Farhaanuddin Mohammed\, BS MicroE ‘26\n\n10:10 a.m. BREAK\n\nMorning Session AM-2\n\nSession Chair: Dr. Karl Hirschman\, Micro n Professor in MicroE\, RIT\n\n10:30 a.m. Invited Talk: “Critical Actini c Mask Metrologies in the EUV Regime”\, Patrick Naulleau\, CEO\, EUV Tec h\, Inc.\n\n11:00 a.m. “Optimization of Growth and Fabrication Condition s to Realize an InP/InGaAs HBT”\, Mason Wolcott\, BS MicroE ‘26\n\n11: 15 a.m. “Characterization of LPCVD Polysilicon”\, Ben Infante\, BS Mic roE ‘26\n\n11:30 a.m. “Investigations of Single-Crystal Silicon-on-Gla ss (SiOG) Substrate for Next Gen Display Devices”\, Matt Lynch\, BS Micr oE ‘26\n\n11:45 a.m. “Encouraging Young Minds Toward Microelectronic E ngineering”\, Elissa Sainthil\, BS MicroE ‘26\n\n12:00 p.m. LUNCH – Dinosaur BBQ\n\nAfternoon Session PM-1\n\nSession Chair: Sean Rommel\, Pro fessor in MicroE\, RIT\n\n1:00 p.m. Invited Talk: “GlobalFoundries Next Gen Photonics Device Offering: Enabling the Future of AI”\, Bob Mulfinge r\, Sr. Manager\, Dep. Dir. Device Engineering\, GlobalFoundries (GF)\n\n1 :30 p.m. “Fabrication of InP Micropillar Arrays via ICP-RIE: A Parameter Space Exploration”\, Aiden Prunoske\, BS MicroE ‘26\n\n1:45 p.m. “I nfluence of Spin-On Doping of Si MacEtch towards Applications in Photovolt aics”\, Race Printup\, BS MicroE ‘26\n\n2:00 p.m. “16-Bit D-2D Digit al to Analog Converter Design”\, Toby Mogendorff\, BS MicroE ‘26\n\n2: 15 p.m. “Comparing Off-Axis and Conventional Exposure Techniques’\, Sc ott Gerber\, BS MicroE ‘26\n\n2:30 p.m. BREAK\n\nAfternoon Session PM-2\ n\nSession Chair: Santosh Kurinec\, Professor in MicroE\, RIT\n\n2:50 p.m. “Cascade Probe Station and Keithley 4200 Parameter Analyzer Testing Dev elopment”\, Aiden Maraia\, BS MicroE ‘26\n\n3:05 p.m. “Gate Oxide In tegrity”\, Yousuf Karim\, BS MicroE ‘26\n\n3:20 p.m. “RIE vs. IBE: P rocess Replacement Study”\, Stephanie Ye\, BS MicroE ‘26\n\n3:35 p.m. “Defect Density and Yield Estimation for Critical CMOS Layers”\, Louis Fleischer\, BS MicroE ‘26\n\n3:50 p.m. “Process Integration and Fabri cation of Torsion Bar-Based Micromirrors”\, Brandon Rinaldi\, BS MicroE ‘26\n\n4:05 p.m. Concluding Comments\n\n4:15 p.m. Adjourn\n\nRoom: 2210 - 2240\, Bldg: CIMS / Slaughter Hall SLA/078 (campus map)\, Rochester Ins titute of Technology\, One Lomb Memorial Drive\, Rochester\, New York\, Un ited States\, 14623 LOCATION:Room: 2210 - 2240\, Bldg: CIMS / Slaughter Hall SLA/078 (campus m ap)\, Rochester Institute of Technology\, One Lomb Memorial Drive\, Roches ter\, New York\, United States\, 14623 ORGANIZER:kdhemc@rit.edu SEQUENCE:122 SUMMARY:44th Annual Microelectronic Engineering Conference at RIT URL;VALUE=URI:https://events.vtools.ieee.org/m/549722 X-ALT-DESC:Description: <br /><p><span style="font-size: 18pt\; color: #000 000\; background-color: #bfedd2\;"><strong><a style="color: #000000\; back ground-color: #bfedd2\;" href="https://events.vtools.ieee.org/event/regist er/549722">Click Here to Register Now!&nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbs p\; &nbsp\;Full Conference Agenda Below!&nbsp\;</a></strong></span></p>\n< p>This conference brings together students\, faculty\, alumni\, friends an d industry guests interested in Microelectronic Engineering. Key elements of the conference are: technical presentations by seniors on their capston e research and design projects\, industry and alumni presentations\, recog nition of companies who have supported the program\, review of program act ivities and achievements over the past year and industry feedback on stude nt and academic program activities.</p>\n<p>The event begins at 2PM on Mon day\, 3/13 at the RIT Inn &amp\; Conference Center with an industrial prog ram review\; all company representatives are welcome and encouraged to att end.&nbsp\; The seniors will be showcasing their research projects at the poster session reception at 4PM\, followed by a dinner program at 5:30PM.& nbsp\; <span style="color: rgb(224\, 62\, 45)\;"><strong>All conference sp eakers\, faculty\, Microelectronic Engineering seniors and graduate studen ts\, and members from industry are invited.&nbsp\;</strong></span></p>\n<p ><strong><span style="color: rgb(132\, 63\, 161)\;"><a style="color: rgb(1 32\, 63\, 161)\;" title="RIT Inn &amp\; Conference Center " href="https:// maps.rit.edu/?details=RIT+Inn+&amp\;+Conference+Center">Off-campus map - R IT Inn &amp\; Conference Center</a></span></strong></p>\n<p>The technical session is on Tuesday\, 3/14 from 8AM - 4:30PM in the Center for Integrate d Manufacturing (CIMS\, SLA/078).&nbsp\; Student talks and invited speaker s are in morning and afternoon sessions\, divided by a noon lunch catered by Dinosaur BBQ!&nbsp\;&nbsp\;</p>\n<p><strong><span style="color: rgb(132 \, 63\, 161)\;"><a style="color: rgb(132\, 63\, 161)\;" href="https://maps .rit.edu/?details=CIMS+Conference+Center">Campus map - CIMS Conference Cen ter</a></span></strong></p>\n<p>Registration is required (no charge) to de termine meal orders.&nbsp\;&nbsp\;</p><br /><br />Agenda: <br /><div data- olk-copy-source="MailCompose"><strong>Monday April 13\, 2026</strong></div >\n<div>RIT Inn and Conference Center</div>\n<div><a href="https://www.map quest.com/us/new-york/rit-inn-conference-center-1825291">https://www.mapqu est.com/us/new-york/rit-inn-conference-center-1825291</a></div>\n<div>&nbs p\;</div>\n<div>2:00 pm&ensp\;&ensp\;&ensp\;&ensp\;&ensp\;Industrial Affil iates Meeting &ndash\; Program Review and Future Directions</div>\n<div>&n bsp\;</div>\n<div>4:00 pm&ensp\;&ensp\;&ensp\;&ensp\;&ensp\;Reception and Poster Session</div>\n<div>&nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\; (for Industrial Affiliates\, Conf erence Speakers\, Faculty\, MicroE Seniors and Graduate Students)</div>\n< div>\n<p>Evening Program&nbsp\;</p>\n</div>\n<div>5:30 pm&ensp\;&nbsp\; &n bsp\; &nbsp\; &nbsp\;Dinner Begins</div>\n<div>\n<p>6:30 pm&ensp\;&ensp\;& ensp\;&nbsp\; &nbsp\; Welcome\, Invited Speaker\, Awards</p>\n<p>&nbsp\; & nbsp\; &nbsp\;<strong> &nbsp\;<span style="color: rgb(224\, 62\, 45)\;">In vited Talk: &ldquo\;Designing Talent\, Manufacturing the Future&rdquo\; by Mindy Murdock\, University Program Director\, INTEL</span></strong></p>\n <p>8:00 pm&nbsp\; &nbsp\; &nbsp\; &nbsp\; &nbsp\;Closing Remarks</p>\n</di v>\n<div>&nbsp\;</div>\n<div>&nbsp\;</div>\n<div><strong>Tuesday April 14\ , 2026</strong></div>\n<div>Louise Slaughter Hall (SLA /building 78)\, Roo ms 2210-2240</div>\n<div><a href="https://maps.rit.edu/details/46">https:/ /maps.rit.edu/details/46</a></div>\n<div>&nbsp\;</div>\n<div>\n<p><strong> 8:00 &ndash\; 8:30 a.m. &nbsp\; &nbsp\;Registration</strong></p>\n<p><stro ng>Morning Session AM-1</strong></p>\n<p>Session Chair: Dr. Robert Pearson \, Professor Emeritus in MicroE\, RIT</p>\n<p>8:30 a.m. &nbsp\; &nbsp\;Wel come: Karl Hirschman\, Microelectronic Engineering Program Director</p>\n< p>8:35 a.m. &nbsp\; &nbsp\; &nbsp\;Opening Remarks: Ferat Sahin\, Departme nt Head Electrical and Microelectronic Engineering\, RIT</p>\n<p><span sty le="color: rgb(224\, 62\, 45)\;"><strong>8:40 a.m. &nbsp\; &nbsp\; Invited Talk: &ldquo\;Holistic Look at the Development of Next Generation EUV Mas k Blanks&rdquo\;\, Bryan Kasprowicz\, Sr. Director\, Technical Strategy at HOYA Corporation\, IT Segment Company</strong></span></p>\n<p>9:10 a.m. & nbsp\; &nbsp\;&ldquo\;Fabrication of Vertical GaN FinFETs&rdquo\;\, Jason Lonneville\, BS MicroE &lsquo\;26&nbsp\;</p>\n<p>9:25 a.m. &nbsp\; &nbsp\; &ldquo\;Measuring Dynamic Conduction and Coss Losses in GaN FETs&rdquo\;\, &nbsp\; &nbsp\; Noah Donner\, BS MicroE &lsquo\;26</p>\n<p>9:40 a.m. &nbs p\; &nbsp\;&ldquo\;Etch Investigation of Materials and Selectivity to Supp ort Double Patterning Workflow&rdquo\;\, Jade Devilliers\, BS MicroE &lsqu o\;26</p>\n<p>9:55 a.m. &nbsp\; &nbsp\;&ldquo\;Self-Alignment Using Monola yer Doping&rdquo\;\, Farhaanuddin Mohammed\, &nbsp\; &nbsp\; BS MicroE &ls quo\;26</p>\n<p>10:10 a.m. &nbsp\; &nbsp\;BREAK</p>\n<p><strong>Morning Se ssion AM-2</strong></p>\n<p>Session Chair: Dr. Karl Hirschman\, Micron Pro fessor in MicroE\, RIT</p>\n<p><span style="color: rgb(224\, 62\, 45)\;">< strong>10:30 a.m. &nbsp\; &nbsp\;Invited Talk: &ldquo\;Critical Actinic Ma sk Metrologies in the EUV Regime&rdquo\;\, Patrick Naulleau\, CEO\, EUV Te ch\, Inc.</strong></span></p>\n<p>11:00 a.m. &nbsp\; &nbsp\;&ldquo\;Optimi zation of Growth and Fabrication Conditions to Realize an InP/InGaAs HBT&r dquo\;\, Mason Wolcott\, BS MicroE &lsquo\;26&nbsp\;</p>\n<p>11:15 a.m. &n bsp\; &nbsp\;&ldquo\;Characterization of LPCVD Polysilicon&rdquo\;\, Ben I nfante\, BS MicroE &lsquo\;26</p>\n<p>11:30 a.m. &nbsp\; &nbsp\;&ldquo\;In vestigations of Single-Crystal Silicon-on-Glass (SiOG) Substrate for Next Gen Display Devices&rdquo\;\, Matt Lynch\, BS MicroE &lsquo\;26</p>\n<p>11 :45 a.m. &nbsp\; &nbsp\;&ldquo\;Encouraging Young Minds Toward Microelectr onic Engineering&rdquo\;\, &nbsp\; &nbsp\; &nbsp\; &nbsp\;Elissa Sainthil\ , BS MicroE &lsquo\;26</p>\n<p>&nbsp\;&nbsp\;<br><strong>12:00 p.m. &nbsp\ ; &nbsp\; LUNCH &ndash\; Dinosaur BBQ</strong></p>\n<p>&nbsp\;<br><strong> Afternoon Session PM-1</strong></p>\n<p>Session Chair: Sean Rommel\, Profe ssor in MicroE\, RIT</p>\n<p><span style="color: rgb(224\, 62\, 45)\;"><st rong>1:00 p.m. &nbsp\; &nbsp\;Invited Talk: &ldquo\;GlobalFoundries Next G en Photonics Device Offering: Enabling the Future of AI&rdquo\;\, Bob Mulf inger\, Sr. Manager\, Dep. Dir. Device Engineering\, GlobalFoundries &nbsp \;(GF)</strong></span></p>\n<p>1:30 p.m. &nbsp\; &nbsp\;&ldquo\;Fabricatio n of InP Micropillar Arrays via ICP-RIE: A Parameter Space Exploration&rdq uo\;\, Aiden Prunoske\, BS MicroE &lsquo\;26&nbsp\;</p>\n<p>1:45 p.m. &nbs p\; &nbsp\;&ldquo\;Influence of Spin-On Doping of Si MacEtch towards Appli cations in Photovoltaics&rdquo\;\, Race Printup\, BS MicroE &lsquo\;26</p> \n<p>2:00 p.m. &nbsp\; &nbsp\;&ldquo\;16-Bit D-2D Digital to Analog Conver ter Design&rdquo\;\, Toby Mogendorff\, &nbsp\; &nbsp\; BS MicroE &lsquo\;2 6</p>\n<p>2:15 p.m. &nbsp\; &nbsp\;&ldquo\;Comparing Off-Axis and Conventi onal Exposure Techniques&rsquo\;\, &nbsp\; &nbsp\; Scott Gerber\, BS Micro E &lsquo\;26<br>&nbsp\; &nbsp\; &nbsp\; &nbsp\;&nbsp\;<br>2:30 p.m. &nbsp\ ; &nbsp\; &nbsp\; &nbsp\; BREAK<br>&nbsp\;<br><strong>Afternoon Session PM -2</strong></p>\n<p><br>Session Chair: Santosh Kurinec\, Professor in Micr oE\, RIT</p>\n<p>2:50 p.m. &nbsp\; &nbsp\; &nbsp\; &ldquo\;Cascade Probe S tation and Keithley 4200 Parameter Analyzer Testing Development&rdquo\;\, Aiden Maraia\, BS MicroE &lsquo\;26&nbsp\;</p>\n<p>3:05 p.m. &nbsp\; &nbsp \;&ldquo\;Gate Oxide Integrity&rdquo\;\, Yousuf Karim\, BS MicroE &lsquo\; 26</p>\n<p>3:20 p.m. &nbsp\; &nbsp\;&ldquo\;RIE vs. IBE: Process Replaceme nt Study&rdquo\;\, Stephanie Ye\, &nbsp\; &nbsp\; &nbsp\; &nbsp\; BS Micro E &lsquo\;26</p>\n<p>3:35 p.m. &nbsp\; &nbsp\;&ldquo\;Defect Density and Y ield Estimation for Critical CMOS Layers&rdquo\;\, &nbsp\; &nbsp\; Louis F leischer\, BS MicroE &lsquo\;26</p>\n<p>3:50 p.m. &nbsp\; &nbsp\;&ldquo\;P rocess Integration and Fabrication of Torsion Bar-Based Micromirrors&rdquo \;\, Brandon Rinaldi\, BS MicroE &lsquo\;26</p>\n<p>4:05 p.m. &nbsp\; &nbs p\;Concluding Comments</p>\n<p><br>4:15 p.m. &nbsp\; &nbsp\; Adjourn</p>\n </div> END:VEVENT END:VCALENDAR