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TZID:Asia/Kolkata
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DTSTART:19451014T230000
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TZOFFSETTO:+0530
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BEGIN:VEVENT
DTSTAMP:20260710T031801Z
UID:B97DB23A-F86A-453C-A4AE-F418A515EE79
DTSTART;TZID=Asia/Kolkata:20260505T090000
DTEND;TZID=Asia/Kolkata:20260505T120000
DESCRIPTION:The Expert Talk on VLSI Fabrication Technologies was organized 
 on 5th May 2026 at the Skill Lab\, K.S. School of Engineering and Manageme
 nt (KSSEM) by the Department of Electronics and Communication Engineering 
 in association with the IEEE KSSEM Student Branch. The session was deliver
 ed by Dr. Jamuna S\, Professor\, Department of ECE\, Dayanand Sagar Colleg
 e of Engineering\, and an IEEE Senior Member.\n\nThe objective of the sess
 ion was to enhance students’ understanding of VLSI fabrication technolog
 ies and their significance in modern semiconductor and electronics industr
 ies. The talk provided an overview of semiconductor device fabrication and
  integrated circuit manufacturing processes\, highlighting their role in e
 nabling advanced electronic systems used across communication\, computing\
 , automotive\, IoT\, and AI applications.\n\nThe speaker introduced fundam
 ental concepts of VLSI technology\, including MOSFET operation\, integrate
 d circuit design\, and the evolution of semiconductor devices. The discuss
 ion emphasized how individual semiconductor components are integrated to f
 orm complex and high-performance systems\, forming the backbone of modern 
 digital technology.\n\nA significant part of the session focused on semico
 nductor fabrication techniques\, where Dr. Jamuna explained the P-well\, N
 -well\, and Twin-Tub fabrication processes used in CMOS technology. She el
 aborated on the advantages and applications of each process and their impo
 rtance in achieving optimized device performance and circuit reliability. 
 To provide students with practical exposure to the manufacturing process\,
  she also presented an informative video demonstrating wafer manufacturing
  and semiconductor fabrication\, helping participants visualize the variou
 s stages involved in chip production.\n\nThe session further covered semic
 onductor fabrication processes\, including the importance of cleanroom env
 ironments\, precision engineering\, process control\, and quality assuranc
 e in chip manufacturing. Recent advancements in VLSI technologies were dis
 cussed along with industry trends shaping the future of semiconductor desi
 gn and fabrication. Students were also briefed on career opportunities in 
 VLSI\, required technical skill sets\, and emerging research areas in the 
 semiconductor domain.\n\nAn interactive question-and-answer session follow
 ed the talk\, during which students engaged with the speaker on topics rel
 ated to semiconductor fabrication\, industry expectations\, and career pat
 hways. The speaker provided detailed insights into current trends and guid
 ed students on academic preparation and skill development for careers in t
 he semiconductor industry.\n\nOverall\, the session effectively bridged th
 eoretical knowledge with real-world industrial applications\, offering val
 uable exposure to VLSI fabrication technologies and motivating students to
  explore careers in semiconductor engineering and chip design.\n\nSkill La
 b\, K. S. School of Engineering and Management (KSSEM)\, No.15\, Mallasand
 ra\, Off. Kanakapura Road\, Bengaluru\, Karnataka\, India\, 560109
LOCATION:Skill Lab\, K. S. School of Engineering and Management (KSSEM)\, N
 o.15\, Mallasandra\, Off. Kanakapura Road\, Bengaluru\, Karnataka\, India\
 , 560109
ORGANIZER:avamsikrishna@ieee.org
SEQUENCE:6
SUMMARY:Expert Talk on VLSI Fabrication Technologies
URL;VALUE=URI:https://events.vtools.ieee.org/m/567309
X-ALT-DESC:Description: &lt;br /&gt;&lt;p&gt;The Expert Talk on VLSI Fabrication Techno
 logies was organized on 5th May 2026 at the Skill Lab\, K.S. School of Eng
 ineering and Management (KSSEM) by the Department of Electronics and Commu
 nication Engineering in association with the IEEE KSSEM Student Branch. Th
 e session was delivered by Dr. Jamuna S\, Professor\, Department of ECE\, 
 Dayanand Sagar College of Engineering\, and an IEEE Senior Member.&lt;/p&gt;\n&lt;p
 &gt;&lt;br&gt;The objective of the session was to enhance students&amp;rsquo\; understa
 nding of VLSI fabrication technologies and their significance in modern se
 miconductor and electronics industries. The talk provided an overview of s
 emiconductor device fabrication and integrated circuit manufacturing proce
 sses\, highlighting their role in enabling advanced electronic systems use
 d across communication\, computing\, automotive\, IoT\, and AI application
 s.&lt;/p&gt;\n&lt;p&gt;The speaker introduced fundamental concepts of VLSI technology\
 , including MOSFET operation\, integrated circuit design\, and the evoluti
 on of semiconductor devices. The discussion emphasized how individual semi
 conductor components are integrated to form complex and high-performance s
 ystems\, forming the backbone of modern digital technology.&lt;/p&gt;\n&lt;p&gt;A sign
 ificant part of the session focused on semiconductor fabrication technique
 s\, where Dr. Jamuna explained the P-well\, N-well\, and Twin-Tub fabricat
 ion processes used in CMOS technology. She elaborated on the advantages an
 d applications of each process and their importance in achieving optimized
  device performance and circuit reliability. To provide students with prac
 tical exposure to the manufacturing process\, she also presented an inform
 ative video demonstrating wafer manufacturing and semiconductor fabricatio
 n\, helping participants visualize the various stages involved in chip pro
 duction.&lt;/p&gt;\n&lt;p&gt;The session further covered semiconductor fabrication pro
 cesses\, including the importance of cleanroom environments\, precision en
 gineering\, process control\, and quality assurance in chip manufacturing.
  Recent advancements in VLSI technologies were discussed along with indust
 ry trends shaping the future of semiconductor design and fabrication. Stud
 ents were also briefed on career opportunities in VLSI\, required technica
 l skill sets\, and emerging research areas in the semiconductor domain.&lt;/p
 &gt;\n&lt;p&gt;An interactive question-and-answer session followed the talk\, durin
 g which students engaged with the speaker on topics related to semiconduct
 or fabrication\, industry expectations\, and career pathways. The speaker 
 provided detailed insights into current trends and guided students on acad
 emic preparation and skill development for careers in the semiconductor in
 dustry.&lt;/p&gt;\n&lt;p&gt;Overall\, the session effectively bridged theoretical know
 ledge with real-world industrial applications\, offering valuable exposure
  to VLSI fabrication technologies and motivating students to explore caree
 rs in semiconductor engineering and chip design.&lt;/p&gt;\n&lt;table style=&quot;border
 -collapse: collapse\; width: 100%\;&quot; border=&quot;1&quot;&gt;&lt;colgroup&gt;&lt;col style=&quot;widt
 h: 33.3009%\;&quot;&gt;&lt;col style=&quot;width: 33.3009%\;&quot;&gt;&lt;col style=&quot;width: 33.3009%\
 ;&quot;&gt;&lt;/colgroup&gt;\n&lt;tbody&gt;\n&lt;tr&gt;\n&lt;td style=&quot;text-align: center\;&quot;&gt;&lt;img src=&quot;
 https://events.vtools.ieee.org/vtools_ui/media/display/a51005c3-e3fb-44c0-
 a502-bd8daa06311b&quot; width=&quot;333&quot; height=&quot;173&quot;&gt;&lt;/td&gt;\n&lt;td style=&quot;text-align: 
 center\;&quot;&gt;&lt;img src=&quot;https://events.vtools.ieee.org/vtools_ui/media/display
 /04a36598-efab-4a45-93f5-75ad2b63b507&quot; width=&quot;343&quot; height=&quot;181&quot;&gt;&lt;/td&gt;\n&lt;td
  style=&quot;text-align: center\;&quot;&gt;&lt;img src=&quot;https://events.vtools.ieee.org/vto
 ols_ui/media/display/e8187801-3664-4fc9-a1c9-19809e0e42b5&quot; width=&quot;182&quot; hei
 ght=&quot;252&quot;&gt;&lt;/td&gt;\n&lt;/tr&gt;\n&lt;/tbody&gt;\n&lt;/table&gt;
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