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DTSTART;TZID=America/Los_Angeles:20260917T113000
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DESCRIPTION:Brain-Scale Intelligence with Atomic-Scale Technology: From 2D 
 Materials to Monolithic 3D AI Computing\n\nWhat becomes possible when we s
 cale computing vertically rather than relying on ever-smaller transistors?
 \n\nThis talk introduces PhantaField’s approach to connecting atomic-sca
 le materials engineering with AI chip architecture—using low-temperature
  two-dimensional semiconductors to bring memory and computation closer tog
 ether.\n\nThe talk begins with NanoGalaxy\, PhantaField’s 12-inch plasma
 - and photon-enhanced metalorganic chemical vapor deposition (MOCVD) platf
 orm. Designed to grow two-dimensional transition-metal dichalcogenides\, i
 ncluding MoS₂\, at temperatures below 450 °C\, NanoGalaxy combines plas
 ma activation and in-situ ultraviolet illumination to support low-temperat
 ure growth and defect control. We will discuss how this approach addresses
  the thermal constraints of back-end-of-line integration and opens a path 
 to building successive layers of active devices above existing circuitry. 
 We will then introduce Sophon\, PhantaField’s monolithic 3D AI accelerat
 or architecture. Its 64-tier reference design interleaves logic and memory
  above a mature 28 nm silicon base\, targeting 330 GB of embedded DRAM and
  2.1 PB/s of local weight bandwidth.\n\nConnecting materials\, manufacturi
 ng\, and architecture\, the presentation will examine the device-performan
 ce requirements\, integration challenges\, and potential system-level bene
 fits of this approach. The central theme is a path toward brain-scale inte
 lligence through atomic-scale technology—not simply by scaling with more
  electricity\, but by rethinking how computation and memory are built toge
 ther.\n\nRead More: [A subthermionic tunnel field-effect transistor with a
 n atomically thin channel](https://www.nature.com/articles/nature15387)[Ph
 antaField PFG-1 Sophon Whitepaper](https://www.phantafield.com/whitepaper)
 \n\nSpeaker:\n\nDr. Xuejun Xie\n\nFounder &amp; CEO PhantaField Inc\n\nAGENDA:
 \n\nThursday September 17\, 2026\n\n11:30 AM: Networking\, Pizza &amp; Drinks\
 n\nNoon -- 1 pm: Seminar\n\nPlease register on Eventbrite before 9:30 AM o
 n Thursday September 17\, 2026\n\n$4 IEEE members $6 non IEEE members\n\n(
 discounts for unemployed and students )\n\nBldg: ==&gt; Use corner entrance: 
 Kifer Road / San Lucar Court ==&gt; Do not enter at main entrance on Kifer Ro
 ad\, EAG Labs\, 810 Kifer Road\, Sunnyvale\, California\, California\, Uni
 ted States\, 95051
LOCATION:Bldg: ==&gt; Use corner entrance: Kifer Road / San Lucar Court ==&gt; Do
  not enter at main entrance on Kifer Road\, EAG Labs\, 810 Kifer Road\, Su
 nnyvale\, California\, California\, United States\, 95051
ORGANIZER:G.M.Friedman@ieee.org
SEQUENCE:20
SUMMARY:2D Materials for Monolithic 3D AI Computing
URL;VALUE=URI:https://events.vtools.ieee.org/m/577071
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 span style=&quot;mso-spacerun: yes\;&quot;&gt; &lt;/span&gt;&lt;span style=&quot;font-size: 24pt\; li
 ne-height: 107%\; font-family: Calibri\, sans-serif\;&quot;&gt;What becomes possib
 le when we scale computing vertically rather than relying on ever-smaller 
 transistors? &lt;/span&gt;&lt;/span&gt;&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoNormal&quot;&gt;&lt;strong&gt;&lt;sp
 an style=&quot;font-size: 20.0pt\; line-height: 107%\;&quot;&gt;&lt;span style=&quot;font-size:
  24pt\; line-height: 107%\; font-family: Calibri\, sans-serif\;&quot;&gt;This talk
  introduces PhantaField&amp;rsquo\;s approach to connecting atomic-scale mater
 ials engineering with AI chip architecture&amp;mdash\;using low-temperature tw
 o-dimensional semiconductors to bring memory and computation closer togeth
 er.&amp;nbsp\;&lt;br&gt;&lt;br&gt;The talk begins with NanoGalaxy\, PhantaField&amp;rsquo\;s 1
 2-inch plasma- and photon-enhanced metalorganic chemical vapor deposition 
 (MOCVD) platform. Designed to grow two-dimensional transition-metal dichal
 cogenides\, including MoS₂\, at temperatures below 450 &amp;deg\;C\, NanoGal
 axy combines plasma activation and in-situ ultraviolet illumination to sup
 port low-temperature growth and defect control. We will discuss how this a
 pproach addresses the thermal constraints of back-end-of-line integration 
 and opens a path to building successive layers of active devices above exi
 sting circuitry. We will then introduce Sophon\, PhantaField&amp;rsquo\;s mono
 lithic 3D AI accelerator architecture. Its 64-tier reference design interl
 eaves logic and memory above a mature 28 nm silicon base\, targeting 330 G
 B of embedded DRAM and 2.1 PB/s of local weight bandwidth.&lt;br&gt;&lt;br&gt;Connecti
 ng materials\, manufacturing\, and architecture\, the presentation will ex
 amine the device-performance requirements\, integration challenges\, and p
 otential system-level benefits of this approach. The central theme is a pa
 th toward brain-scale intelligence through atomic-scale technology&amp;mdash\;
 not simply by scaling with more electricity\, but by rethinking how comput
 ation and memory are built together.&amp;nbsp\;&lt;br&gt;&lt;br&gt;Read More:&amp;nbsp\;&lt;a hre
 f=&quot;https://www.nature.com/articles/nature15387&quot; target=&quot;_blank&quot; rel=&quot;noope
 ner&quot;&gt;A subthermionic tunnel field-effect transistor with an atomically thi
 n channel&lt;br&gt;&amp;nbsp\; &amp;nbsp\; &amp;nbsp\;&lt;/a&gt;&lt;a href=&quot;https://www.phantafield.c
 om/whitepaper&quot; target=&quot;_blank&quot; rel=&quot;noopener&quot;&gt;PhantaField PFG-1 Sophon Whi
 tepaper&lt;/a&gt;&lt;/span&gt;&lt;/span&gt;&lt;/strong&gt;&lt;strong&gt;&lt;span style=&quot;font-size: 20.0pt\;
  line-height: 107%\;&quot;&gt;&lt;!-- [if !supportLineBreakNewLine]--&gt;&lt;!--[endif]--&gt;&lt;
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 ize: 26.0pt\; line-height: 107%\;&quot;&gt;Speaker:&lt;/span&gt;&lt;/strong&gt;&lt;/p&gt;\n&lt;p class=
 &quot;MsoNormal&quot;&gt;&lt;span style=&quot;font-family: arial\, helvetica\, sans-serif\;&quot;&gt;&lt;s
 trong&gt;&lt;span style=&quot;font-size: 26.0pt\; line-height: 107%\;&quot;&gt;&lt;span style=&quot;f
 ont-size: 24pt\;&quot;&gt;&lt;span style=&quot;line-height: 107%\;&quot;&gt;Dr. Xuejun Xie&lt;/span&gt;&lt;
 /span&gt;&lt;/span&gt;&lt;/strong&gt;&lt;/span&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoNormal&quot;&gt;&lt;span style=&quot;font-
 family: arial\, helvetica\, sans-serif\;&quot;&gt;&lt;strong&gt;&lt;span style=&quot;font-size: 
 26.0pt\; line-height: 107%\;&quot;&gt;&lt;span style=&quot;font-size: 24pt\;&quot;&gt;&lt;span style=
 &quot;line-height: 107%\;&quot;&gt;Founder &amp;amp\; CEO&amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;n
 bsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbs
 p\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\
 ; &amp;nbsp\; &amp;nbsp\; &amp;nbsp\; &lt;/span&gt;&lt;/span&gt;&lt;/span&gt;&lt;/strong&gt;&lt;/span&gt;&lt;span style
 =&quot;font-family: arial\, helvetica\, sans-serif\;&quot;&gt;&lt;strong&gt;&lt;span style=&quot;font
 -size: 26.0pt\; line-height: 107%\;&quot;&gt;&lt;span style=&quot;font-size: 24pt\;&quot;&gt;&lt;span
  style=&quot;line-height: 107%\;&quot;&gt;PhantaField Inc&lt;/span&gt;&lt;/span&gt;&lt;/span&gt;&lt;/strong&gt;
 &lt;/span&gt;&lt;/p&gt;\n&lt;p class=&quot;MsoNormal&quot;&gt;&lt;strong&gt;&lt;span style=&quot;font-size: 20.0pt\;
  line-height: 107%\;&quot;&gt;&amp;nbsp\;&lt;/span&gt;&lt;/strong&gt;&lt;strong&gt;AGENDA:&lt;/strong&gt;&lt;/p&gt;\
 n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/form&gt;&lt;/div&gt;\n&lt;/div&gt;\n&lt;/
 section&gt;\n&lt;/main&gt;&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;
 /div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/d
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 u can include things to know\, venue information\, accessibility options&amp;m
 dash\;anything that will help people know what to expect.&quot;&gt;\n&lt;div id=&quot;Abou
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  e1pmrtpl0&quot;&gt;\n&lt;p&gt;&lt;strong&gt;Thursday September 17&lt;/strong&gt;&lt;strong&gt;\, 2026&lt;/st
 rong&gt;&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;11:30 AM: Networking\, Pizza &amp;amp\; Drinks&lt;/strong&gt;&lt;
 /p&gt;\n&lt;p&gt;&lt;strong&gt;Noon -- 1 pm: Seminar&lt;/strong&gt;&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;Please regi
 ster on Eventbrite before 9:30 AM on&lt;/strong&gt;&lt;strong&gt; Thursday September 1
 7\, 2026&lt;/strong&gt;&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;$4 IEEE members&amp;nbsp\; $6 non IEEE membe
 rs &lt;/strong&gt;&lt;/p&gt;\n&lt;p&gt;&lt;strong&gt;(discounts for unemployed and students&lt;/stron
 g&gt; )&lt;/p&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;\n&lt;/div&gt;
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