Gary Eden

Since  their  inception  in  the  mid-1990s,  microcavity  plasma  arrays  have  shown themselves to be of unusual promise, not only from the perspective of basic plasma science  but  also  for  their  commercial  value.  Several  aspects  of  the  physics  of microcavity plasmas will be illustrated through  the performance of  plasma bipolar junction transistors and the characteristics of microplasmas propagating in and over

dielectric microchannels. Microwave bandstop filters operating in the 120-160 GHz interval have been realized with three-dimensional photonic crystals comprising arrays of microplasma columns. The commercialization, over the past decade, of high power,flat UV/VUV lamps, and microplasma systems being manufactured for the disinfection of drinking water and surfaces, as well as the treatment of wastewater, will also be described.

Biography:

Gary Eden, member in National Academy of Engineering and National Academy of Inventors, is engaged in research in atomic, molecular and ultrafast laser spectroscopy, the discovery and development of ultraviolet lasers and lamps, and the science and technology of microcavity plasma devices. He has served as Assistant Dean in the College of Engineering, Associate Dean of the Graduate College, and Associate Vice-Chancellor for Research in University of Illinois. Currently, he is the Gilmore Family Professor  in  the  Department  of  Electrical  and  Computer Engineering and Director of the Laboratory for Optical Physics and Engineering, is a member of four honorary organizations, and is a Fellow of the IEEE, the Optical Society of America, the American Physical Society, the American Association for the Advancement of Science (AAAS), and the SPIE.

He has served as Editor-in-Chief of the IEEE Journal of Quantum Electronics, and Editor-in-Chief of Progress in Quantum Electronics. He is also an Associate Editor of Applied Physics Reviews. In 1998, he served as President of the IEEE Lasers and Electro-Optics Society (LEOS), following earlier service as a member of the LEOS Board of Governors, and as the Vice-President for Technical Affairs. Dr. Eden received the  LEOS  Distinguished Service Award,  was  awarded the  IEEE Third Millennium Medal in 2000 and was named a LEOS Distinguished Lecturer for 2003-2005. Between 2015 and 2017, he also served as a Distinguished Lecturer for the American Physical Society Division of Plasma Physics. From 1996 through 1999, he was the James F. Towey  University  Scholar  at  the  University  of  Illinois.  In  2005,  he  received  the IEEE/LEOS Aron Kressel Award.

He was awarded the C.E.K. Mees Medal of the Optical Society of America in 2007, and was the recipient of the Fulbright-Israel Distinguished Chair in the Natural Sciences and Engineering for 2007-2008. He is a co-founder of Eden Park Illumination (2007) and EP Purification (2010), and was named the recipient of the Harold E. Edgerton Award of SPIE for 2010.

Address:China

Mark Kushner

Many of the recent advances in materials processing have relied on synergistic and sometimes fortuitous interactions of plasma produced activation energy – radicals, ions photons –  with surfaces.    As  control  of  plasmas is  becoming more refined, new opportunities arise to leverage this activation energy for fabrication of new materials and  to  innovate  new  applications. On  one  extreme,  these  advances  have  been motivated  by  the  increasingly  more  difficult  to  meet  demands  of  microelectronics fabrication,  having  smaller  features  with  tighter  critical  dimensions.       At  another extreme, plasma treatment of biological materials, from polymers to living tissue, is motivating an  entirely  new  regime  of  control  of  plasmas  at  atmospheric  pressure. These latter processes have brought to the forefront the interactions of plasma with liquids, with applications ranging from human therapies to agriculture.      In this talk, strategies  for  controlling  plasma  produced  activation  energy  to  surfaces  will  be discussed with examples from computer modeling of plasma chemistry and plasma

surface interactions for microelectronics fabrication and plasma activation of liquids. Plasma activated microelectronics processes is challenged by plasma etching of high aspect   ratio   features   (aspect   ratios   >   100)   and   atomic   layer   etching   having sub-monolayer  control.  In  principle,  plasma  activation  of  liquids  share  the  same challenges  of  selectively  controlling  activation  energy  –  however,  doing  so  at atmospheric pressure brings a yet another unique set of challenges. 

Biography:

Mark J. Kushner, IEEE Fellow and professor in University of Michigan, is director of Michigan Institute for Plasma Science and Engineering. He received the BS in Nuclear Engineering and the BA in Astronomy from the University of California at Los Angeles; and the MS and Ph.D. in Applied Physics from the California Institute of Technology.   After a post-doctoral appointment, Mark served on the technical staffs of Sandia National Laboratory, Lawrence Livermore National Laboratory and Spectra Technology before  joining  the  University  of  Illinois  at  Urbana-Champaign where  he  was  the  Founder  Professor  of  Engineering  and  held several administrative positions.   Mark served as Dean of Engineering at Iowa State University before joining the University of Michigan in 2008.   His research addresses the fundamentals of low temperature plasmas and their applications.    Mark has held several leadership positions in professional societies, conferences and in scientific publishing, as well as participating in national assessments of plasma physics.

Address:China