NEMS and MEMS at Furtwangen University
In the presentations research projects in the field of Nano-Electro-Mechanical and Micro-Electro-Mechanical Systems (NEMS and MEMS) at Furtwangen University (Germany) are presented. Especially, results from several research projects about miniaturized sensors and actuators are discussed.
A concept for integrating self-organized nanoprocessing techniques into common Si-technology (micro-nano-integration) has been developed. Using porous Si a self-organized nanomaterial different applications such as biosensing, passive and active optical filters and bonding based on the Velcro-principle where introduced in the last few years at the Institute for Applied Research.
For MOEMS, a new approach for stress optimization is presented which allows the realization of large active focusing micromirrors based on SOI-technology.
Date and Time
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- 161 Warren St
- Newark, New Jersey
- United States 07102
- Building: ECEC
- Room Number: 202
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- Contact: Dr.-Ing. Ajay Kumar Poddar, (201) 560-3806 (akpoddar@ieee.org), Prof. Edip Niver- (973)596-3542 (edip.niver@njit.edu) Prof. Durgamadhav Misra (dmisra@njit.edu)
- Co-sponsored by ED/CAS & MTT/AP Chapters
- Starts 11 December 2013 01:00 PM UTC
- Ends 05 February 2014 10:00 PM UTC
- No Admission Charge
Speakers
Ulrich Mescheder of Hochschule Furtwangen – University
In the presentations research projects in the field of Nano-Electro-Mechanical and Micro-Electro-Mechanical Systems (NEMS and MEMS) at Furtwangen University (Germany) are presented. Especially, results from several research projects about miniaturized sensors and actuators are discussed. A concept for integrating self-organized nanoprocessing techniques into common Si-technology (micro-nano-integration) has been developed. Using porous Si a self-organized nanomaterial different applications such as biosensing, passive and active optical filters and bonding based on the Velcro-principle where introduced in the last few years at the Institute for Applied Research. For MOEMS, a new approach for stress optimization is presented which allows the realization of large active focusing micromirrors based on SOI-technology.
Biography:
Prof. Ulrich Mescheder was born on March 16, 1957 in Stukenbrock, Germany. He received his Dipl. Phys., Ph.D. (Dr. rer nat) in 1982 after study at University Bielefeld and Marburg (focus on solid state physics). He has been a professor at Hochschule Furtwangen – University Department Computer and Electrical Engineering and Institute for Applied Research, Furtwangen. His research activities includes Microtechnology/Micromachining, Microsystems (MEMS), Nanotechnology. He is a member of German Physical society, Verband deutscher Hochschullehrer and IEEE. He is currently the Executive Vice-president for Research Director Institute for Applied Research, Director Competence Center for Microfabrication and Systemintegration, Baden Württemberg (ZeMiS) Vice-director Graduation school GenMik (University Freiburg) he has worked on „Optoelectrical Measurements of amorphous Silicon“.
From1985-1991 he was with with the Philips Research Laboratory, Hamburg, Department Material Science, Thin film technology. He was a Visiting scientist at the Institute for Microstructuring Technology (IMT) in Berlin, working on technological developments for x-ray-lithography (mask technology and characterisation techniques).
Email:
Address:Furtwangen, Germany
Ulrich Mescheder of Hochschule Furtwangen – University
Biography:
Email:
Address:Furtwangen, Germany
Agenda
Seminar at 5:00 pm.
ECE Conference Room: ECEC-202
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