Seasonal School on microelectronic technologies for micro and nanosensor systems

#Microelectronic #Technologies; #Clean #room; #hybrid #seasonal #school
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A course that has an on-line format enabling remote attendance.

OBJECTIVE

This specialized seasonal school introduces attendees to the microelectronic technologies and fabrication processes available at the Institut de Microelectrònica de Barcelona (IMB-CNM, CSIC), the biggest clean room facility in Spain. This Seasonal School will follow an on-line format.

The programme emphasizes technologies relevant to micro- and nanosystems production. Participants will gain a comprehensive understanding of planar silicon-based microelectronic technologies and their role in the design and development of cutting-edge micro/nanosystem components applicable to sensing.

All lectures will be streamed, enabling an unlimited number of on-line registered attendees to follow them.

 

TARGET AUDIENCE

This course is tailored to the interests and expertise of Academia and Industry working on sensor systems, micro- and nano-fabrication, semiconductor devices, or related technologies. The focus will be on research-oriented application. Therefore, target audience comprises mainly:

-          PhD students.  Early-career researchers. Senior researchers. Technical specialists. 


  Date and Time

  Location

  Hosts

  Registration


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  • Contact Event Host

  • Eduard Llobet is professor at University Rovira i Virgili, Tarragona, Spain.

  • Co-sponsored by National Centre of Microelectronics and Spanish Network on Nanotechnology and Microsystems (IBERNAM)
  • Starts 09 March 2026 11:00 PM UTC
  • Ends 13 June 2026 10:00 PM UTC
  • No Admission Charge

  Speakers

Miguel of IMB-CNM-CSIC

Topic:

Good Practices in Clean Room facilities

Alberto of IMB-CNM-CSIIC

Topic:

Implantation Technologies

Biography:

Expert in computational materials science. h = 46.


David of IMB-CNM-CSIC

Topic:

Microelectronics Integration

Biography:

Head of the Clean room facility

Joan of IMB-CNM-CSIC

Topic:

Introduction to microelectronics

Biography:

MEMS and NEMS expert. h = 38.


Jofre of IMB-CNM-CSIC

Topic:

Reverse Engineering

Biography:

Reverse engineering expert.

Javier of IMB-CNM-CSIC

Topic:

Optical lithography

Biography:

Expert in lithography


Leyre of IMB-CNM-CSIC

Topic:

Physical Vapour Deposition

Biography:

Expert in thin films and metallization.

Marta of IMB-CNM-CSIC

Topic:

Microsystem Technologies


Núria of IMB-CNM-CSIC

Topic:

Clean ing and wet etching

Pablo of IMB-CNM-CSIC

Topic:

Simulation of devices and processess

Biography:

Expert in process engineering. h = 34.


Francisco of IMB-CNM-CSIC

Topic:

Cricuit design and simulation

Biography:

Expert in analig and mixed signal design and simulation. h = 20.

Sara of IMB-CNM-CSIC

Topic:

Oxidation processes & Doping processes in silicon


Roser of IMB-CNM-CSIC

Topic:

Dry etching

Ricard of IMB-CNM-CSIC

Topic:

Chemical Vapor Deposition


Xavier of IMB-CNM-CSIC

Topic:

Electron-beam lithography




Agenda

The course will be delivered over five days and will include:

-          Theoretical Lessons: 15 hours distributed in 7 sessions (7x 2 hours/session + 1 specialist session)

SCHEDULE

Daily, from 9 h to 14 h.

 

PLACE

Theoretical sessions: Sala de Actos Pepe Millán at IMB-CNM (CSIC), Campus de la UAB, Bellaterra, Barcelona, Spain. Will be streamed and recorded.