CASS Talk with Cristina Meinhardt
Very Large Scale Integration (VLSI) integrated circuits using nanotechnology require new materials, structures, and CAD tools to deal with problems arising from the manufacturing process, such as variability. Some types of design are more or less robust to process or environmental variations, either systematic or random. This presentation evaluates the behavior of FinFET technology in technologies beyond 20nm. FinFet technology is a substitute for CMOS technology in the manufacturing process. Predictive information about the behavior of this technology in the cell design is important for both designers and developers of EDA tools.
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Cristina Meinhardt
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