IEEE Benelux Section LMAG: Visit to IMEC (B)
Program:
12.30-13.30 welcome
13.30-14.00 Device architecture changes: planar->FinFETs -> Nanosheets -> CFET: Devin Verreck
14.00-14.30 Evolution of lithography for logic scaling from 248nm to highNA EUV: Kurt Ronse, Progam Director
14.30-15.00 DTCO and STCO: Fernando Garcia, Principal Member of Technical Staff
15.00-15.30 Packaging and System Integration Readiness for Mobile genAI by Joshua A. H. Klein, Researcher SID
15.30-16.00 visit to the cleanroom
Date and Time
Location
Hosts
Registration
- Date: 19 Jun 2025
- Time: 10:30 AM UTC to 02:00 PM UTC
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