Plasma processing for etching and deposition in semiconductor manufacturing.

#Energetic #Particles #etching #manufacturing #microelectronics

Dear MIPSE Visitors and Friends,

Our final MIPSE seminar of the semester will be given by Dr. Benjamin Yee and Dr. Hema Swaroop Mopidevi of Lam Research Corp. The seminar, to be presented on Wednesday, April 16, at 3:10 pm in room 1003 EECS, is titled “Grand Challenges in RF & Plasmas for Next Generation Semiconductor Manufacturing”. In this talk, an overview of the role of plasma processing for etching and deposition in semiconductor manufacturing will be given, with emphasis on the state-of-the-art challenges in fabricating advanced microelectronics and quantum devices. The importance of RF (radio frequency) power delivery to sustain these plasmas, often pulsed power, will also be discussed. 

Please see attached flyer or MIPSE website for details.  
The seminar will be conducted in person and simulcast via Zoom (see login instructions on the MIPSE website). 

Welcome: 3:10 PM

Presentation:

Q&A

Closing

IEEE Southeastern Michigan Section